Full Multilayer Laue Lens for focusing hard x-rays.
- Center for Nanoscale Materials
Multilayer Laue Lenses (MLLs) were developed by us using dynamic diffraction effects to efficiently focus hard x-rays to very small spots. Using a partial MLL we were able to focus 19.5-keV hard x-rays to a line focus of 16 nm with an efficiency of 31%. A full MLL is a complete linear MLL structure. It can be fabricated by bonding two partial MLL wafers, or by growing the full structure using magnetron sputtering without bonding. A 40-{micro}m full MLL, with a total of 5166 layers of WSi{sub 2} and Si, has been successfully grown by sputter deposition. The layer thicknesses gradually vary from 4 nm to {approx}400 nm and then back to 4 nm. Two coating runs were used to grow the full structure, one for each half. It took over 56 h for each run. A 100-{micro}m nearly-full MLL was constructed by bonding. Each 50-{micro}m half-structure has 1788 WSi{sub 2} and Si layers with 12-nm to {approx}32-nm thicknesses and {approx}32-{micro}m total thickness, followed by a thick WSi{sub 2} layer of {approx}17 {micro}m, and an AuSn layer of {approx}1 {micro}m. Both full MLL structures survived dicing and polishing. The primary results demonstrate the feasibility and potential of a full MLL with a doubled numerical aperture and large beam acceptance for hard x-rays.
- Research Organization:
- Argonne National Laboratory (ANL)
- Sponsoring Organization:
- SC
- DOE Contract Number:
- AC02-06CH11357
- OSTI ID:
- 1010894
- Report Number(s):
- ANL/XSD/CP-65258
- Country of Publication:
- United States
- Language:
- ENGLISH
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