Effects of interface states on the transport properties of all-oxide La{sub 0.8}Sr{sub 0.2}CoO{sub 3}/SrTi{sub 0.99}Nb{sub 0.01}O{sub 3} p-n heterojunctions
- GFMC, Departamento Fisica Aplicada III, Universidad Complutense de Madrid, 28040 Madrid (Spain)
- Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455 (United States)
Electrical transport properties of heteroepitaxial p-n junctions made of La{sub 0.8}Sr{sub 0.2}CoO{sub 3} and SrTi{sub 0.99}Nb{sub 0.01}O{sub 3} were studied. Junctions display highly rectifying current-voltage characteristics over a wide temperature range (20-300 K). Two distinct transport mechanisms are identified: tunneling assisted by interface states at T<130 K and diffusion/recombination at higher temperatures. Capacitance-voltage characteristics are used to determine the junction built-in potential at different frequencies. A capacitance relaxation is found due to charge trapping at interface states. Interface states, which deeply affect transport, are discussed in connection to charge-transfer processes related to the polarity mismatch at the interface.
- OSTI ID:
- 21120559
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 8 Vol. 92; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
CAPACITANCE
CHARGE EXCHANGE
COBALT OXIDES
ELECTRIC POTENTIAL
ELECTRONS
LANTHANUM COMPOUNDS
NIOBIUM OXIDES
P-N JUNCTIONS
RECOMBINATION
RELAXATION
STRONTIUM COMPOUNDS
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0013-0065 K
TEMPERATURE RANGE 0065-0273 K
TEMPERATURE RANGE 0273-0400 K
TITANIUM COMPOUNDS
TRAPPING
TRAPS
TUNNEL EFFECT
CAPACITANCE
CHARGE EXCHANGE
COBALT OXIDES
ELECTRIC POTENTIAL
ELECTRONS
LANTHANUM COMPOUNDS
NIOBIUM OXIDES
P-N JUNCTIONS
RECOMBINATION
RELAXATION
STRONTIUM COMPOUNDS
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0013-0065 K
TEMPERATURE RANGE 0065-0273 K
TEMPERATURE RANGE 0273-0400 K
TITANIUM COMPOUNDS
TRAPPING
TRAPS
TUNNEL EFFECT