Direct Visualization of Charge Migration in Bilayer Tantalum Oxide Films by Multimodal Imaging
Abstract
Inspired by biological neuromorphic computing, artificial neural networks based on crossbar arrays of bilayer tantalum oxide memristors have shown to be promising alternatives to conventional complementary metal-oxide-semiconductor (CMOS) architectures. In order to understand the driving mechanism in these oxide systems, tantalum oxide films are resistively switched by conductive atomic force microscopy (C-AFM), and subsequently imaged by kelvin probe force microscopy (KPFM) and spatially resolved time-of-flight secondary ion mass spectrometry (ToF-SIMS). These workflows enable induction and analysis of the resistive switching mechanism as well as control over the resistively switched region of the film. In this work it is shown that the resistive switching mechanism is driven by both current and electric field effects. Reversible oxygen motion is enabled by applying low (<1 V) electric fields, while high electric fields generate irreversible breakdown of the material (>1 V). Fully understanding oxygen motion and electrical effects in bilayer oxide memristor systems is a fundamental step toward the adoption of memristors as a neuromorphic computing technology.
- Authors:
-
- University of Tennessee, Knoxville, TN (United States)
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sandia National Laboratories (SNL-CA), Livermore, CA (United States)
- Arizona State University, Tempe, AZ (United States)
- Publication Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF); USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 2281139
- Alternate Identifier(s):
- OSTI ID: 2311253
- Report Number(s):
- SAND-2023-14614J
Journal ID: ISSN 2199-160X
- Grant/Contract Number:
- AC05-00OR22725; NA0003525
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Advanced Electronic Materials
- Additional Journal Information:
- Journal Volume: 10; Journal Issue: 1; Journal ID: ISSN 2199-160X
- Publisher:
- Wiley
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; memristor; tantalum oxide; ReRAM
Citation Formats
Flynn‐Hepford, Matthew, Lasseter, John, Kravchenko, Ivan, Randolph, Steven, Keum, Jong, Sumpter, Bobby G., Jesse, Stephen, Maksymovych, Petro, Talin, A. Alec, Marinella, Matthew J., Rack, Philip D., Ievlev, Anton V., and Ovchinnikova, Olga S. Direct Visualization of Charge Migration in Bilayer Tantalum Oxide Films by Multimodal Imaging. United States: N. p., 2023.
Web. doi:10.1002/aelm.202300589.
Flynn‐Hepford, Matthew, Lasseter, John, Kravchenko, Ivan, Randolph, Steven, Keum, Jong, Sumpter, Bobby G., Jesse, Stephen, Maksymovych, Petro, Talin, A. Alec, Marinella, Matthew J., Rack, Philip D., Ievlev, Anton V., & Ovchinnikova, Olga S. Direct Visualization of Charge Migration in Bilayer Tantalum Oxide Films by Multimodal Imaging. United States. https://doi.org/10.1002/aelm.202300589
Flynn‐Hepford, Matthew, Lasseter, John, Kravchenko, Ivan, Randolph, Steven, Keum, Jong, Sumpter, Bobby G., Jesse, Stephen, Maksymovych, Petro, Talin, A. Alec, Marinella, Matthew J., Rack, Philip D., Ievlev, Anton V., and Ovchinnikova, Olga S. Mon .
"Direct Visualization of Charge Migration in Bilayer Tantalum Oxide Films by Multimodal Imaging". United States. https://doi.org/10.1002/aelm.202300589. https://www.osti.gov/servlets/purl/2281139.
@article{osti_2281139,
title = {Direct Visualization of Charge Migration in Bilayer Tantalum Oxide Films by Multimodal Imaging},
author = {Flynn‐Hepford, Matthew and Lasseter, John and Kravchenko, Ivan and Randolph, Steven and Keum, Jong and Sumpter, Bobby G. and Jesse, Stephen and Maksymovych, Petro and Talin, A. Alec and Marinella, Matthew J. and Rack, Philip D. and Ievlev, Anton V. and Ovchinnikova, Olga S.},
abstractNote = {Inspired by biological neuromorphic computing, artificial neural networks based on crossbar arrays of bilayer tantalum oxide memristors have shown to be promising alternatives to conventional complementary metal-oxide-semiconductor (CMOS) architectures. In order to understand the driving mechanism in these oxide systems, tantalum oxide films are resistively switched by conductive atomic force microscopy (C-AFM), and subsequently imaged by kelvin probe force microscopy (KPFM) and spatially resolved time-of-flight secondary ion mass spectrometry (ToF-SIMS). These workflows enable induction and analysis of the resistive switching mechanism as well as control over the resistively switched region of the film. In this work it is shown that the resistive switching mechanism is driven by both current and electric field effects. Reversible oxygen motion is enabled by applying low (<1 V) electric fields, while high electric fields generate irreversible breakdown of the material (>1 V). Fully understanding oxygen motion and electrical effects in bilayer oxide memristor systems is a fundamental step toward the adoption of memristors as a neuromorphic computing technology.},
doi = {10.1002/aelm.202300589},
journal = {Advanced Electronic Materials},
number = 1,
volume = 10,
place = {United States},
year = {Mon Nov 13 00:00:00 EST 2023},
month = {Mon Nov 13 00:00:00 EST 2023}
}
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