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Title: Demonstration of >6.0-kV Breakdown Voltage in Large Area Vertical GaN p-n Diodes With Step-Etched Junction Termination Extensions

Abstract

Vertical gallium nitride (GaN) p-n diodes have garnered significant interest for use in power electronics where high-voltage blocking and high-power efficiency are of concern. In this article, we detail the growth and fabrication methods used to develop a large area (1 mm2) vertical GaN p-n diode capable of a 6.0-kV breakdown. We also demonstrate a large area diode with a forward pulsed current of 3.5 A, an 8.3-mΩ$$\cdot$$cm2 differential specific ON-resistance, and a 5.3-kV reverse breakdown. In addition, we report on a smaller area diode (0.063 mm2) that is capable of 6.4-kV breakdown with a differential specific ON-resistance of 10.2 mΩ$$\cdot$$cm2, when accounting for current spreading through the drift region at a 45° angle. Finally, the demonstration of avalanche breakdown is shown for a 0.063-mm2 diode with a room temperature breakdown of 5.6 kV. In this work, these results were achieved via epitaxial growth of a 50-μm drift region with a very low carrier concentration of <1×1015 cm–3 and a carefully designed four-zone junction termination extension.

Authors:
ORCiD logo [1]; ORCiD logo [1];  [1];  [1];  [1]; ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [1];  [1]; ORCiD logo [1]
  1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E); USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1882896
Report Number(s):
SAND2022-2471J
Journal ID: ISSN 0018-9383; 703855
Grant/Contract Number:  
NA0003525
Resource Type:
Accepted Manuscript
Journal Name:
IEEE Transactions on Electron Devices
Additional Journal Information:
Journal Volume: 69; Journal Issue: 4; Journal ID: ISSN 0018-9383
Publisher:
IEEE
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; avalanche breakdown; gallium nitride; junction termination extension (JTE); power devices; vertical p-n diode

Citation Formats

Yates, Luke, Gunning, Brendan P., Crawford, Mary H., Steinfeldt, Jeffrey, Smith, Michael L., Abate, Vincent M., Dickerson, Jeramy R., Armstrong, Andrew M., Binder, Andrew, Allerman, Andrew A., and Kaplar, Robert J. Demonstration of >6.0-kV Breakdown Voltage in Large Area Vertical GaN p-n Diodes With Step-Etched Junction Termination Extensions. United States: N. p., 2022. Web. doi:10.1109/ted.2022.3154665.
Yates, Luke, Gunning, Brendan P., Crawford, Mary H., Steinfeldt, Jeffrey, Smith, Michael L., Abate, Vincent M., Dickerson, Jeramy R., Armstrong, Andrew M., Binder, Andrew, Allerman, Andrew A., & Kaplar, Robert J. Demonstration of >6.0-kV Breakdown Voltage in Large Area Vertical GaN p-n Diodes With Step-Etched Junction Termination Extensions. United States. https://doi.org/10.1109/ted.2022.3154665
Yates, Luke, Gunning, Brendan P., Crawford, Mary H., Steinfeldt, Jeffrey, Smith, Michael L., Abate, Vincent M., Dickerson, Jeramy R., Armstrong, Andrew M., Binder, Andrew, Allerman, Andrew A., and Kaplar, Robert J. Thu . "Demonstration of >6.0-kV Breakdown Voltage in Large Area Vertical GaN p-n Diodes With Step-Etched Junction Termination Extensions". United States. https://doi.org/10.1109/ted.2022.3154665. https://www.osti.gov/servlets/purl/1882896.
@article{osti_1882896,
title = {Demonstration of >6.0-kV Breakdown Voltage in Large Area Vertical GaN p-n Diodes With Step-Etched Junction Termination Extensions},
author = {Yates, Luke and Gunning, Brendan P. and Crawford, Mary H. and Steinfeldt, Jeffrey and Smith, Michael L. and Abate, Vincent M. and Dickerson, Jeramy R. and Armstrong, Andrew M. and Binder, Andrew and Allerman, Andrew A. and Kaplar, Robert J.},
abstractNote = {Vertical gallium nitride (GaN) p-n diodes have garnered significant interest for use in power electronics where high-voltage blocking and high-power efficiency are of concern. In this article, we detail the growth and fabrication methods used to develop a large area (1 mm2) vertical GaN p-n diode capable of a 6.0-kV breakdown. We also demonstrate a large area diode with a forward pulsed current of 3.5 A, an 8.3-mΩ$\cdot$cm2 differential specific ON-resistance, and a 5.3-kV reverse breakdown. In addition, we report on a smaller area diode (0.063 mm2) that is capable of 6.4-kV breakdown with a differential specific ON-resistance of 10.2 mΩ$\cdot$cm2, when accounting for current spreading through the drift region at a 45° angle. Finally, the demonstration of avalanche breakdown is shown for a 0.063-mm2 diode with a room temperature breakdown of 5.6 kV. In this work, these results were achieved via epitaxial growth of a 50-μm drift region with a very low carrier concentration of <1×1015 cm–3 and a carefully designed four-zone junction termination extension.},
doi = {10.1109/ted.2022.3154665},
journal = {IEEE Transactions on Electron Devices},
number = 4,
volume = 69,
place = {United States},
year = {Thu Mar 10 00:00:00 EST 2022},
month = {Thu Mar 10 00:00:00 EST 2022}
}

Works referenced in this record:

5.0 kV breakdown-voltage vertical GaN p–n junction diodes
journal, February 2018

  • Ohta, Hiroshi; Hayashi, Kentaro; Horikiri, Fumimasa
  • Japanese Journal of Applied Physics, Vol. 57, Issue 4S
  • DOI: 10.7567/JJAP.57.04FG09

High Voltage Vertical GaN p-n Diodes With Avalanche Capability
journal, October 2013

  • Kizilyalli, Isik C.; Edwards, Andrew P.; Nie, Hui
  • IEEE Transactions on Electron Devices, Vol. 60, Issue 10
  • DOI: 10.1109/TED.2013.2266664

GaN devices for automotive application and their challenges in adoption
conference, December 2018


Semiconductors for high‐voltage, vertical channel field‐effect transistors
journal, March 1982

  • Baliga, B. J.
  • Journal of Applied Physics, Vol. 53, Issue 3, p. 1759-1764
  • DOI: 10.1063/1.331646

Experimental evaluation of impact ionization coefficients in GaN
journal, December 1999

  • Kunihiro, K.; Kasahara, K.; Takahashi, Y.
  • IEEE Electron Device Letters, Vol. 20, Issue 12
  • DOI: 10.1109/55.806100

Direct Observation of Gate Leakage Paths in AlGaN/GaN High Electron Mobility Transistors by Electron Beam–Induced Current
journal, September 2018

  • Chen, Lixiang; Ma, Xiaohua; Zhu, Jiejie
  • IEEE Transactions on Device and Materials Reliability, Vol. 18, Issue 3
  • DOI: 10.1109/TDMR.2018.2847664

Impact ionization coefficients and critical electric field in GaN
journal, May 2021

  • Maeda, Takuya; Narita, Tetsuo; Yamada, Shinji
  • Journal of Applied Physics, Vol. 129, Issue 18
  • DOI: 10.1063/5.0050793

Characterization of Pd/Ni/Au ohmic contacts on p-GaN
journal, May 2005


Current and future directions in power electronic devices and circuits based on wide band-gap semiconductors
conference, October 2017

  • Kizilyalli, Isik C.; Xu, Yanzhi Ann; Carlson, Eric
  • 2017 IEEE 5th Workshop on Wide Bandgap Power Devices and Applications (WiPDA)
  • DOI: 10.1109/WiPDA.2017.8170583

Vertical Power p-n Diodes Based on Bulk GaN
journal, February 2015

  • Kizilyalli, Isik C.; Edwards, Andrew P.; Aktas, Ozgur
  • IEEE Transactions on Electron Devices, Vol. 62, Issue 2
  • DOI: 10.1109/TED.2014.2360861

The 2018 GaN power electronics roadmap
journal, March 2018

  • Amano, H.; Baines, Y.; Beam, E.
  • Journal of Physics D: Applied Physics, Vol. 51, Issue 16
  • DOI: 10.1088/1361-6463/aaaf9d

3.7 kV Vertical GaN PN Diodes
journal, February 2014

  • Kizilyalli, Isik C.; Edwards, Andrew P.; Nie, Hui
  • IEEE Electron Device Letters, Vol. 35, Issue 2
  • DOI: 10.1109/LED.2013.2294175

Bevel Edge Termination for Vertical GaN Power Diodes
conference, October 2019

  • Binder, Andrew T.; Dickerson, Jeramy R.; Crawford, Mary H.
  • 2019 IEEE 7th Workshop on Wide Bandgap Power Devices and Applications (WiPDA)
  • DOI: 10.1109/WiPDA46397.2019.8998835

Robust avalanche in GaN leading to record performance in avalanche photodiode
conference, April 2020


Simulation and Design of Step-Etched Junction Termination Extensions for GaN Power Diodes
conference, April 2020

  • Dickerson, Jeramy R.; Binder, Andrew T.; Pickrell, Greg
  • 2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
  • DOI: 10.1109/EDTM47692.2020.9117883

Development of High-Voltage Vertical GaN PN Diodes
conference, December 2020


Electrical effects of plasma damage in p-GaN
journal, October 1999

  • Cao, X. A.; Pearton, S. J.; Zhang, A. P.
  • Applied Physics Letters, Vol. 75, Issue 17
  • DOI: 10.1063/1.125080

High-Breakdown-Voltage and Low-Specific-on-Resistance GaN p–n Junction Diodes on Free-Standing GaN Substrates Fabricated Through Low-Damage Field-Plate Process
journal, February 2013

  • Hatakeyama, Yoshitomo; Nomoto, Kazuki; Terano, Akihisa
  • Japanese Journal of Applied Physics, Vol. 52, Issue 2R
  • DOI: 10.7567/JJAP.52.028007

Avalanche Capability of Vertical GaN p-n Junctions on Bulk GaN Substrates
journal, September 2015


Performance Limits of Vertical Unipolar Power Devices in GaN and 4H-SiC
journal, June 2020


Reduction of leakage current at the SiNx/GaN interface in GaN Schottky diodes
journal, September 2018

  • Kolli, Sowmya; Sunkara, Mahendra; Alphenaar, Bruce
  • Journal of Materials Science: Materials in Electronics, Vol. 29, Issue 22
  • DOI: 10.1007/s10854-018-0064-3

Design of Ion-Implanted Junction Termination Extension for Vertical GaN Pin Rectifiers
journal, September 2020

  • Cho, Minkyu; Xu, Zhiyu; Bakhtiary-Noodeh, Marzieh
  • ECS Transactions, Vol. 98, Issue 6
  • DOI: 10.1149/09806.0049ecst

GaN power devices for Electric Vehicles State-of-the-art and future perspective
conference, November 2018

  • Longobardi, Giorgia; Efthymiou, Loizos; Arnold, Martin
  • 2018 IEEE International Conference on Electrical Systems for Aircraft, Railway, Ship Propulsion and Road Vehicles & International Transportation Electrification Conference (ESARS-ITEC)
  • DOI: 10.1109/ESARS-ITEC.2018.8607788

Simulations of Junction Termination Extensions in Vertical GaN Power Diodes
journal, May 2017

  • Wierer, Jonathan J.; Dickerson, Jeramy R.; Allerman, Andrew A.
  • IEEE Transactions on Electron Devices, Vol. 64, Issue 5
  • DOI: 10.1109/TED.2017.2684093

Power Electronic Devices and Systems Based on Bulk GaN Substrates
journal, June 2018


Identification of the primary compensating defect level responsible for determining blocking voltage of vertical GaN power diodes
journal, October 2016

  • King, M. P.; Kaplar, R. J.; Dickerson, J. R.
  • Applied Physics Letters, Vol. 109, Issue 18
  • DOI: 10.1063/1.4966903

Comparative Study of Heatsink Volume and Weight Optimization in SST DAB cells Employing GaN, SiC-MOSFET and Si-IGBT Switches
conference, February 2019

  • Beiranvand, Hamzeh; Rokrok, Esmaeel; Liserre, Marco
  • 2019 10th International Power Electronics, Drive Systems and Technologies Conference (PEDSTC)
  • DOI: 10.1109/PEDSTC.2019.8697276

Review of Recent Progress on Vertical GaN-Based PN Diodes
journal, June 2021


Grid Value Investigation of Medium-Voltage Back-to-Back Converters
conference, February 2021

  • Zhu, Xiangqi; Singh, Akanksha; Mather, Barry
  • 2021 IEEE Power & Energy Society Innovative Smart Grid Technologies Conference (ISGT)
  • DOI: 10.1109/ISGT49243.2021.9372266

Deep-level transient spectroscopy of low-free-carrier-concentration n-GaN layers grown on freestanding GaN substrates: Dependence on carbon compensation ratio
journal, May 2016

  • Tanaka, Takeshi; Shiojima, Kenji; Mishima, Tomoyoshi
  • Japanese Journal of Applied Physics, Vol. 55, Issue 6
  • DOI: 10.7567/JJAP.55.061101

On impact ionization and avalanche in gallium nitride
journal, December 2020

  • Ji, Dong; Chowdhury, Srabanti
  • Applied Physics Letters, Vol. 117, Issue 25
  • DOI: 10.1063/5.0031504

Vertical GaN Power Diodes With a Bilayer Edge Termination
journal, January 2016

  • Dickerson, Jeramy R.; Allerman, Andrew A.; Bryant, Benjamin N.
  • IEEE Transactions on Electron Devices, Vol. 63, Issue 1, p. 419-425
  • DOI: 10.1109/TED.2015.2502186

Advanced SiC and GaN power electronics for automotive systems
conference, December 2010

  • Kanechika, Masakazu; Uesugi, Tsutomu; Kachi, Tetsu
  • 2010 International Electron Devices Meeting
  • DOI: 10.1109/IEDM.2010.5703356

Experimental determination of impact ionization coefficients of electrons and holes in gallium nitride using homojunction structures
journal, August 2019

  • Ji, Dong; Ercan, Burcu; Chowdhury, Srabanti
  • Applied Physics Letters, Vol. 115, Issue 7
  • DOI: 10.1063/1.5099245

High voltage and high current density vertical GaN power diodes
journal, June 2016

  • Fischer, A. J.; Dickerson, J. R.; Armstrong, A. M.
  • Electronics Letters, Vol. 52, Issue 13
  • DOI: 10.1049/el.2016.1156

Deeply and vertically etched butte structure of vertical GaN p–n diode with avalanche capability
journal, May 2019

  • Fukushima, Hayata; Usami, Shigeyoshi; Ogura, Masaya
  • Japanese Journal of Applied Physics, Vol. 58, Issue SC
  • DOI: 10.7567/1347-4065/ab106c

Temperature Dependence of Electron and Hole Impact Ionization Coefficients in GaN
journal, March 2021

  • Cao, Lina; Zhu, Zhongtao; Harden, Galen
  • IEEE Transactions on Electron Devices, Vol. 68, Issue 3
  • DOI: 10.1109/TED.2021.3054355

Gallium nitride devices for power electronic applications
journal, June 2013


10 kV, 39 mΩ·cm2 Multi-Channel AlGaN/GaN Schottky Barrier Diodes
journal, June 2021