n-Type doping of a solution processed p-type semiconductor using isoelectronic surface dopants for homojunction fabrication
Abstract
The p-n junction is one of the fundamental requirements for a practical semiconductor-based electronic device. Designing a heterojunction comprising of dissimilar p-type and n-type semiconductors calls for careful energy level considerations, both when selecting the semiconductor materials as well as the metal contacts. A homojunction based on a single semiconductor simplifies this task, as energy levels of the p-type and n-type materials are already fairly similar, allowing for easier selection of contacts. Traditionally, homojunctions rely on doping of a bulk semiconductor to achieve p- and n-type transport through controlled addition of aliovalent dopants via energy-intensive processes such as ion implantation or thermal annealing. Exact control of doping in nanocrystalline semiconductors is significantly more challenging, due to self-purification effects. However, owing to their large surface areas, surface moieties can be utilized to both dope the nanostructures as well as tune their energy levels. Here, we present a facile technique based on an isoelectronic surface dopant in order to achieve p- and n-type materials based on the same semiconductor. We show that thin p-type colloidal Bi2Te3 nanowires can be switched to n-type through surface functionalization, thus increasing the availability of new nanocrystalline solution-processable p-n homojunctions.
- Authors:
-
- New York University, Brooklyn, NY (United States)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. of California, Berkeley, CA (United States)
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Molecular Foundry
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
- OSTI Identifier:
- 1875451
- Alternate Identifier(s):
- OSTI ID: 1856455
- Grant/Contract Number:
- AC02-05CH11231; DMR-1420073; DMR-0923251
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Applied Surface Science
- Additional Journal Information:
- Journal Volume: 590; Journal ID: ISSN 0169-4332
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; isoelectronic surface doping; p-n homojunction; solution processable; Bi2Te3 nanowires
Citation Formats
Mølnås, Håvard, Russ, Boris M., Farrell, Steven L., Gordon, Madeleine P., Urban, Jeffrey J., and Sahu, Ayaskanta. n-Type doping of a solution processed p-type semiconductor using isoelectronic surface dopants for homojunction fabrication. United States: N. p., 2022.
Web. doi:10.1016/j.apsusc.2022.153089.
Mølnås, Håvard, Russ, Boris M., Farrell, Steven L., Gordon, Madeleine P., Urban, Jeffrey J., & Sahu, Ayaskanta. n-Type doping of a solution processed p-type semiconductor using isoelectronic surface dopants for homojunction fabrication. United States. https://doi.org/10.1016/j.apsusc.2022.153089
Mølnås, Håvard, Russ, Boris M., Farrell, Steven L., Gordon, Madeleine P., Urban, Jeffrey J., and Sahu, Ayaskanta. Wed .
"n-Type doping of a solution processed p-type semiconductor using isoelectronic surface dopants for homojunction fabrication". United States. https://doi.org/10.1016/j.apsusc.2022.153089. https://www.osti.gov/servlets/purl/1875451.
@article{osti_1875451,
title = {n-Type doping of a solution processed p-type semiconductor using isoelectronic surface dopants for homojunction fabrication},
author = {Mølnås, Håvard and Russ, Boris M. and Farrell, Steven L. and Gordon, Madeleine P. and Urban, Jeffrey J. and Sahu, Ayaskanta},
abstractNote = {The p-n junction is one of the fundamental requirements for a practical semiconductor-based electronic device. Designing a heterojunction comprising of dissimilar p-type and n-type semiconductors calls for careful energy level considerations, both when selecting the semiconductor materials as well as the metal contacts. A homojunction based on a single semiconductor simplifies this task, as energy levels of the p-type and n-type materials are already fairly similar, allowing for easier selection of contacts. Traditionally, homojunctions rely on doping of a bulk semiconductor to achieve p- and n-type transport through controlled addition of aliovalent dopants via energy-intensive processes such as ion implantation or thermal annealing. Exact control of doping in nanocrystalline semiconductors is significantly more challenging, due to self-purification effects. However, owing to their large surface areas, surface moieties can be utilized to both dope the nanostructures as well as tune their energy levels. Here, we present a facile technique based on an isoelectronic surface dopant in order to achieve p- and n-type materials based on the same semiconductor. We show that thin p-type colloidal Bi2Te3 nanowires can be switched to n-type through surface functionalization, thus increasing the availability of new nanocrystalline solution-processable p-n homojunctions.},
doi = {10.1016/j.apsusc.2022.153089},
journal = {Applied Surface Science},
number = ,
volume = 590,
place = {United States},
year = {Wed Mar 16 00:00:00 EDT 2022},
month = {Wed Mar 16 00:00:00 EDT 2022}
}
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