Study of the crystal structure of SnS thin films by atomic layer deposition
Abstract
Tin monosulfide, SnS, absorbs visible light and holds promise for thin-film photovoltaics. However, the optoelectronic properties of this material vary among the different structural phases, and control over the phase of vapor deposited SnS thin films is not well understood. In order to study the phases and crystallographic orientations of SnS films, films with thicknesses of 90 nm–750nm were prepared by atomic layer deposition (ALD) at temperatures between 80 °C and 200 °C on amorphous silicon dioxide (a-SiO2) and single-crystal sodium chloride (NaCl). We show that the crystal structures and orientations of the ALD-SnS thin films vary with deposition temperature, film thickness, and substrate. We confirm the presence of metastable cubic π-SnS in co-existence with the thermodynamically stable orthorhombic α-SnS and find that the π phase is more prevalent at lower deposition temperatures. The films grown on a-SiO2 are textured, the degree of texturing increases with lower temperature or higher thickness, and the deposited phase is also thickness dependent. Upon annealing, which is known to promote SnS grain growth, all films revert to orthorhombic α-SnS. The films grown on the NaCl(100) substrate exhibit a much higher degree of texturing and show different preferred orientations dependent on the phase: π-(400) andmore »
- Authors:
-
- Harvard Univ., Cambridge, MA (United States)
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Publication Date:
- Research Org.:
- SLAC National Accelerator Lab., Menlo Park, CA (United States). Stanford Synchrotron Radiation Lightsource (SSRL); Energy Frontier Research Centers (EFRC) (United States). Center for Next Generation of Materials Design (CNGMD)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)
- OSTI Identifier:
- 1781601
- Alternate Identifier(s):
- OSTI ID: 1773184
- Grant/Contract Number:
- UGA-0-41029-16/ER392000; AC02-76SF00515
- Resource Type:
- Accepted Manuscript
- Journal Name:
- AIP Advances
- Additional Journal Information:
- Journal Volume: 11; Journal Issue: 3; Journal ID: ISSN 2158-3226
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; Atomic layer deposition; Photovoltaics; High resolution X-ray diffraction; Synchrotrons; Epitaxy; Thin films; Optoelectronic properties; Electrical properties and parameters; Phase transitions; Crystal structure
Citation Formats
Zhao, Xizhu, Davis, Luke M., Lou, Xiabing, Kim, Sang Bok, Uličná, Soňa, Jayaraman, Ashwin, Yang, Chuanxi, Schelhas, Laura T., and Gordon, Roy. Study of the crystal structure of SnS thin films by atomic layer deposition. United States: N. p., 2021.
Web. doi:10.1063/5.0032782.
Zhao, Xizhu, Davis, Luke M., Lou, Xiabing, Kim, Sang Bok, Uličná, Soňa, Jayaraman, Ashwin, Yang, Chuanxi, Schelhas, Laura T., & Gordon, Roy. Study of the crystal structure of SnS thin films by atomic layer deposition. United States. https://doi.org/10.1063/5.0032782
Zhao, Xizhu, Davis, Luke M., Lou, Xiabing, Kim, Sang Bok, Uličná, Soňa, Jayaraman, Ashwin, Yang, Chuanxi, Schelhas, Laura T., and Gordon, Roy. Mon .
"Study of the crystal structure of SnS thin films by atomic layer deposition". United States. https://doi.org/10.1063/5.0032782. https://www.osti.gov/servlets/purl/1781601.
@article{osti_1781601,
title = {Study of the crystal structure of SnS thin films by atomic layer deposition},
author = {Zhao, Xizhu and Davis, Luke M. and Lou, Xiabing and Kim, Sang Bok and Uličná, Soňa and Jayaraman, Ashwin and Yang, Chuanxi and Schelhas, Laura T. and Gordon, Roy},
abstractNote = {Tin monosulfide, SnS, absorbs visible light and holds promise for thin-film photovoltaics. However, the optoelectronic properties of this material vary among the different structural phases, and control over the phase of vapor deposited SnS thin films is not well understood. In order to study the phases and crystallographic orientations of SnS films, films with thicknesses of 90 nm–750nm were prepared by atomic layer deposition (ALD) at temperatures between 80 °C and 200 °C on amorphous silicon dioxide (a-SiO2) and single-crystal sodium chloride (NaCl). We show that the crystal structures and orientations of the ALD-SnS thin films vary with deposition temperature, film thickness, and substrate. We confirm the presence of metastable cubic π-SnS in co-existence with the thermodynamically stable orthorhombic α-SnS and find that the π phase is more prevalent at lower deposition temperatures. The films grown on a-SiO2 are textured, the degree of texturing increases with lower temperature or higher thickness, and the deposited phase is also thickness dependent. Upon annealing, which is known to promote SnS grain growth, all films revert to orthorhombic α-SnS. The films grown on the NaCl(100) substrate exhibit a much higher degree of texturing and show different preferred orientations dependent on the phase: π-(400) and α-(111) or α-(040). In addition, we demonstrate a proof-of-concept device made from the highly oriented SnS grown on NaCl.},
doi = {10.1063/5.0032782},
journal = {AIP Advances},
number = 3,
volume = 11,
place = {United States},
year = {Mon Mar 29 00:00:00 EDT 2021},
month = {Mon Mar 29 00:00:00 EDT 2021}
}
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