Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations
Abstract
Solid-phase epitaxy (SPE) and other three-dimensional epitaxial crystallization processes pose challenging structural and chemical characterization problems. The concentration of defects, the spatial distribution of elastic strain, and the chemical state of ions each vary with nanoscale characteristic length scales and depend sensitively on the gas environment and elastic boundary conditions during growth. The lateral or three-dimensional propagation of crystalline interfaces in SPE has nanoscale or submicrometer characteristic distances during typical crystallization times. Here, an in situ synchrotron hard x-ray instrument allows these features to be studied during deposition and crystallization using diffraction, resonant scattering, nanobeam and coherent diffraction imaging, and reflectivity. The instrument incorporates a compact deposition system allowing the use of short-working-distance x-ray focusing optics. Layers are deposited using radio-frequency magnetron sputtering and evaporation sources. The deposition system provides control of the gas atmosphere and sample temperature. The sample is positioned using a stable mechanical design to minimize vibration and drift and employs precise translation stages to enable nanobeam experiments. Results of in situ x-ray characterization of the amorphous thin film deposition process for a SrTiO3/BaTiO3 multilayer illustrate implementation of this instrument.
- Authors:
-
- Univ. of Wisconsin, Madison, WI (United States)
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Publication Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; National Science Foundation (NSF); USDOE
- OSTI Identifier:
- 1774161
- Alternate Identifier(s):
- OSTI ID: 1765926
- Grant/Contract Number:
- AC02-06CH11357; DMR-1720415
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Review of Scientific Instruments
- Additional Journal Information:
- Journal Volume: 92; Journal Issue: 2; Journal ID: ISSN 0034-6748
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION; x-ray instruments; crystallization; coherence imaging; x-ray microscopy; thin film deposition; synchrotrons; epitaxy; materials analysis; hard x-rays; magnetron sputtering
Citation Formats
Marks, Samuel D., Quan, Peiyu, Liu, Rui, Highland, Matthew J., Zhou, Hua, Kuech, Thomas F., Stephenson, G. Brian, and Evans, Paul G. Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations. United States: N. p., 2021.
Web. doi:10.1063/5.0039196.
Marks, Samuel D., Quan, Peiyu, Liu, Rui, Highland, Matthew J., Zhou, Hua, Kuech, Thomas F., Stephenson, G. Brian, & Evans, Paul G. Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations. United States. https://doi.org/10.1063/5.0039196
Marks, Samuel D., Quan, Peiyu, Liu, Rui, Highland, Matthew J., Zhou, Hua, Kuech, Thomas F., Stephenson, G. Brian, and Evans, Paul G. Mon .
"Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations". United States. https://doi.org/10.1063/5.0039196. https://www.osti.gov/servlets/purl/1774161.
@article{osti_1774161,
title = {Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations},
author = {Marks, Samuel D. and Quan, Peiyu and Liu, Rui and Highland, Matthew J. and Zhou, Hua and Kuech, Thomas F. and Stephenson, G. Brian and Evans, Paul G.},
abstractNote = {Solid-phase epitaxy (SPE) and other three-dimensional epitaxial crystallization processes pose challenging structural and chemical characterization problems. The concentration of defects, the spatial distribution of elastic strain, and the chemical state of ions each vary with nanoscale characteristic length scales and depend sensitively on the gas environment and elastic boundary conditions during growth. The lateral or three-dimensional propagation of crystalline interfaces in SPE has nanoscale or submicrometer characteristic distances during typical crystallization times. Here, an in situ synchrotron hard x-ray instrument allows these features to be studied during deposition and crystallization using diffraction, resonant scattering, nanobeam and coherent diffraction imaging, and reflectivity. The instrument incorporates a compact deposition system allowing the use of short-working-distance x-ray focusing optics. Layers are deposited using radio-frequency magnetron sputtering and evaporation sources. The deposition system provides control of the gas atmosphere and sample temperature. The sample is positioned using a stable mechanical design to minimize vibration and drift and employs precise translation stages to enable nanobeam experiments. Results of in situ x-ray characterization of the amorphous thin film deposition process for a SrTiO3/BaTiO3 multilayer illustrate implementation of this instrument.},
doi = {10.1063/5.0039196},
journal = {Review of Scientific Instruments},
number = 2,
volume = 92,
place = {United States},
year = {Mon Feb 01 00:00:00 EST 2021},
month = {Mon Feb 01 00:00:00 EST 2021}
}
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