Photon bunching in cathodoluminescence induced by indirect electron excitation
Abstract
The impulsive excitation of ensembles of excitons or color centers by a high-energy electron beam results in the observation of photon bunching in the second-order correlation function of the cathodoluminescence generated by those emitters. Photon bunching in cathodoluminescence microscopy can be used to resolve the excited-state dynamics and the excitation and emission efficiency of nanoscale materials, and it can be used to probe interactions between emitters and nanophotonic cavities. Unfortunately, the required integration times for these measurements can be problematic for beam-sensitive materials. Here, we report substantial changes in the measured bunching induced by indirect electron interactions (with indirect electron excitation inducing g2(0) values approaching 104). This result is critical to the interpretation of g2(τ) in cathodoluminescence microscopies, and, more importantly, it provides a foundation for the nanoscale characterization of optical properties in beam-sensitive materials.
- Authors:
-
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
- Technical University of Denmark, 2800 Kongens Lyngby, Denmark
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA, Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
- Publication Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)
- OSTI Identifier:
- 1974628
- Alternate Identifier(s):
- OSTI ID: 1984350
- Grant/Contract Number:
- AC05-00OR22725
- Resource Type:
- Published Article
- Journal Name:
- Nanoscale
- Additional Journal Information:
- Journal Name: Nanoscale Journal Volume: 15 Journal Issue: 22; Journal ID: ISSN 2040-3364
- Publisher:
- Royal Society of Chemistry (RSC)
- Country of Publication:
- United Kingdom
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Iyer, Vasudevan, Roccapriore, Kevin, Ng, Jacob, Srijanto, Bernadeta, Lingerfelt, David, and Lawrie, Benjamin. Photon bunching in cathodoluminescence induced by indirect electron excitation. United Kingdom: N. p., 2023.
Web. doi:10.1039/D3NR00376K.
Iyer, Vasudevan, Roccapriore, Kevin, Ng, Jacob, Srijanto, Bernadeta, Lingerfelt, David, & Lawrie, Benjamin. Photon bunching in cathodoluminescence induced by indirect electron excitation. United Kingdom. https://doi.org/10.1039/D3NR00376K
Iyer, Vasudevan, Roccapriore, Kevin, Ng, Jacob, Srijanto, Bernadeta, Lingerfelt, David, and Lawrie, Benjamin. Thu .
"Photon bunching in cathodoluminescence induced by indirect electron excitation". United Kingdom. https://doi.org/10.1039/D3NR00376K.
@article{osti_1974628,
title = {Photon bunching in cathodoluminescence induced by indirect electron excitation},
author = {Iyer, Vasudevan and Roccapriore, Kevin and Ng, Jacob and Srijanto, Bernadeta and Lingerfelt, David and Lawrie, Benjamin},
abstractNote = {The impulsive excitation of ensembles of excitons or color centers by a high-energy electron beam results in the observation of photon bunching in the second-order correlation function of the cathodoluminescence generated by those emitters. Photon bunching in cathodoluminescence microscopy can be used to resolve the excited-state dynamics and the excitation and emission efficiency of nanoscale materials, and it can be used to probe interactions between emitters and nanophotonic cavities. Unfortunately, the required integration times for these measurements can be problematic for beam-sensitive materials. Here, we report substantial changes in the measured bunching induced by indirect electron interactions (with indirect electron excitation inducing g2(0) values approaching 104). This result is critical to the interpretation of g2(τ) in cathodoluminescence microscopies, and, more importantly, it provides a foundation for the nanoscale characterization of optical properties in beam-sensitive materials.},
doi = {10.1039/D3NR00376K},
journal = {Nanoscale},
number = 22,
volume = 15,
place = {United Kingdom},
year = {Thu Jun 08 00:00:00 EDT 2023},
month = {Thu Jun 08 00:00:00 EDT 2023}
}
https://doi.org/10.1039/D3NR00376K
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