Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

Zhang, Cheng; Dyck, Ondrej; Garfinkel, David A.; Stanford, Michael G.; Belianinov, Alex A.; Fowlkes, Jason D.; Jesse, Stephen; Rack, Philip D.

doi:10.3390/nano9101394

Title: Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

Abstract

A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.

Authors:

; Dyck, Ondrej; Garfinkel, David A.; Stanford, Michael G.; Belianinov, Alex A.; Fowlkes, Jason D.; Jesse, Stephen;

Publication Date:: Mon Sep 30 00:00:00 EDT 2019

Research Org.:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1567714

Alternate Identifier(s):: OSTI ID: 1606989

Grant/Contract Number:: AC05-00OR22725

Resource Type:: Published Article

Journal Name:: Nanomaterials

Additional Journal Information:: Journal Name: Nanomaterials Journal Volume: 9 Journal Issue: 10; Journal ID: ISSN 2079-4991

Publisher:: MDPI

Country of Publication:: Switzerland

Language:: English

Subject:: 36 MATERIALS SCIENCE; graphene; direct-write kirigami; nanopatterning; pulsed laser

Citation Formats


                    Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, and Rack, Philip D. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns.  Switzerland: N. p., 2019. 
Web.  doi:10.3390/nano9101394.

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                    Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, & Rack, Philip D. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns.  Switzerland.  https://doi.org/10.3390/nano9101394

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                    Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, and Rack, Philip D. Mon .  
"Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns".  Switzerland.  https://doi.org/10.3390/nano9101394.

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@article{osti_1567714,

  title        = {Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns},

  author       = {Zhang, Cheng and Dyck, Ondrej and Garfinkel, David A. and Stanford, Michael G. and Belianinov, Alex A. and Fowlkes, Jason D. and Jesse, Stephen and Rack, Philip D.},

  abstractNote = {A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.},

  doi          = {10.3390/nano9101394},

  journal      = {Nanomaterials},

  number       = 10,

  volume       = 9,

  place        = {Switzerland},

  year         = {Mon Sep 30 00:00:00 EDT 2019},

  month        = {Mon Sep 30 00:00:00 EDT 2019}

}

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Title: Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

Abstract

Citation Formats

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