Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

Zhang, Cheng; Dyck, Ondrej; Garfinkel, David; Stanford, Michael; Belianinov, Alex; Fowlkes, Jason Davidson; Jesse, Stephen; Rack, Philip D.

doi:10.3390/nano9101394

Title: Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

Journal Article · 30 September 2019 · Nanomaterials

DOI: https://doi.org/10.3390/nano9101394 · OSTI ID:1567714

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^[2]; Garfinkel, David ^[3]; Stanford, Michael ^[3];

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Univ. of Tennessee, Knoxville, TN (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS)
Univ. of Tennessee, Knoxville, TN (United States)

A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 1567714

Alternate ID(s):: OSTI ID: 1606989

Journal Information:: Nanomaterials, Vol. 9, Issue 10; ISSN 2079-4991

Publisher:: MDPICopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 9 works

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Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 Zhang, Cheng; Dyck, Ondrej; Garfinkel, David A. Nanomaterials, Vol. 10, Issue 2 https://doi.org/10.3390/nano10020273	journal	February 2020

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Title: Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

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