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Title: Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

Abstract

A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.

Authors:
ORCiD logo; ; ; ; ; ; ; ORCiD logo
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1567714
Alternate Identifier(s):
OSTI ID: 1606989
Grant/Contract Number:  
AC05-00OR22725
Resource Type:
Published Article
Journal Name:
Nanomaterials
Additional Journal Information:
Journal Name: Nanomaterials Journal Volume: 9 Journal Issue: 10; Journal ID: ISSN 2079-4991
Publisher:
MDPI
Country of Publication:
Switzerland
Language:
English
Subject:
36 MATERIALS SCIENCE; graphene; direct-write kirigami; nanopatterning; pulsed laser

Citation Formats

Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, and Rack, Philip D. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Switzerland: N. p., 2019. Web. doi:10.3390/nano9101394.
Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, & Rack, Philip D. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Switzerland. doi:10.3390/nano9101394.
Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, and Rack, Philip D. Mon . "Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns". Switzerland. doi:10.3390/nano9101394.
@article{osti_1567714,
title = {Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns},
author = {Zhang, Cheng and Dyck, Ondrej and Garfinkel, David A. and Stanford, Michael G. and Belianinov, Alex A. and Fowlkes, Jason D. and Jesse, Stephen and Rack, Philip D.},
abstractNote = {A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.},
doi = {10.3390/nano9101394},
journal = {Nanomaterials},
number = 10,
volume = 9,
place = {Switzerland},
year = {2019},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.3390/nano9101394

Citation Metrics:
Cited by: 1 work
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