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Title: Negative differential resistance in GaN homojunction tunnel diodes and low voltage loss tunnel contacts

Abstract

The current-voltage characteristics and metastability in GaN p++/n++ homojunction tunnel diodes and n++/p++/i/n tunnel-contacted diodes grown via metal modulated epitaxy have been reported on. The room temperature negative differential resistance (NDR) beginning at ~1.35 V is discussed for GaN homojunction devices grown on sapphire. The NDR vanishes, and the conductivity increases as multiple I-V sweeps are performed, thus implying that charge trapping states with long trap lifetimes exist at defect sites, and these traps play a crucial role in the tunneling mechanism. Additionally, the use of extremely high n-type (ND ~ 4.6×1020 cm–3) and p-type (NA ~ 7.7×1020 cm–3) doping results in a near linear characteristic with minimal rectification at current densities less than 200 A/cm2 and soft rectification above this current density. Forward-bias tunneling and NDR are still present at 77 K. The highest silicon-doped n++/p++/i/n tunnel-contacted pin diode demonstrates a turn-on voltage of 3.12 V, only 0.14 V higher than that of the pin control diode, and an improved specific on-resistance of 3.24 ×10–4 Ω cm2, which is 13% lower than that of the control pin diode.

Authors:
 [1]; ORCiD logo [1];  [1]; ORCiD logo [1];  [1];  [1]
  1. Georgia Inst. of Technology, Atlanta, GA (United States)
Publication Date:
Research Org.:
Arizona State Univ., Tempe, AZ (United States)
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E); National Science Foundation (NSF)
OSTI Identifier:
1540218
Alternate Identifier(s):
OSTI ID: 1454896
Grant/Contract Number:  
AR0000470
Resource Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 112; Journal Issue: 25; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Clinton, Evan A., Vadiee, Ehsan, Shen, Shyh-Chiang, Mehta, Karan, Yoder, P. Douglas, and Doolittle, W. Alan. Negative differential resistance in GaN homojunction tunnel diodes and low voltage loss tunnel contacts. United States: N. p., 2018. Web. doi:10.1063/1.5035293.
Clinton, Evan A., Vadiee, Ehsan, Shen, Shyh-Chiang, Mehta, Karan, Yoder, P. Douglas, & Doolittle, W. Alan. Negative differential resistance in GaN homojunction tunnel diodes and low voltage loss tunnel contacts. United States. https://doi.org/10.1063/1.5035293
Clinton, Evan A., Vadiee, Ehsan, Shen, Shyh-Chiang, Mehta, Karan, Yoder, P. Douglas, and Doolittle, W. Alan. Tue . "Negative differential resistance in GaN homojunction tunnel diodes and low voltage loss tunnel contacts". United States. https://doi.org/10.1063/1.5035293. https://www.osti.gov/servlets/purl/1540218.
@article{osti_1540218,
title = {Negative differential resistance in GaN homojunction tunnel diodes and low voltage loss tunnel contacts},
author = {Clinton, Evan A. and Vadiee, Ehsan and Shen, Shyh-Chiang and Mehta, Karan and Yoder, P. Douglas and Doolittle, W. Alan},
abstractNote = {The current-voltage characteristics and metastability in GaN p++/n++ homojunction tunnel diodes and n++/p++/i/n tunnel-contacted diodes grown via metal modulated epitaxy have been reported on. The room temperature negative differential resistance (NDR) beginning at ~1.35 V is discussed for GaN homojunction devices grown on sapphire. The NDR vanishes, and the conductivity increases as multiple I-V sweeps are performed, thus implying that charge trapping states with long trap lifetimes exist at defect sites, and these traps play a crucial role in the tunneling mechanism. Additionally, the use of extremely high n-type (ND ~ 4.6×1020 cm–3) and p-type (NA ~ 7.7×1020 cm–3) doping results in a near linear characteristic with minimal rectification at current densities less than 200 A/cm2 and soft rectification above this current density. Forward-bias tunneling and NDR are still present at 77 K. The highest silicon-doped n++/p++/i/n tunnel-contacted pin diode demonstrates a turn-on voltage of 3.12 V, only 0.14 V higher than that of the pin control diode, and an improved specific on-resistance of 3.24 ×10–4 Ω cm2, which is 13% lower than that of the control pin diode.},
doi = {10.1063/1.5035293},
journal = {Applied Physics Letters},
number = 25,
volume = 112,
place = {United States},
year = {Tue Jun 19 00:00:00 EDT 2018},
month = {Tue Jun 19 00:00:00 EDT 2018}
}

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Works referencing / citing this record:

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Ultra-wide-bandgap AlGaN homojunction tunnel diodes with negative differential resistance
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