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Title: Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography

Abstract

Interference lithography is a flexible technique for creating 3D periodic nano- and micro-structures that can be used to make a wide variety of crystal lattices but, as we have found, some lattices require index-matched substrates to eliminate reflections at the photoresist-substrate interface. Here we present a tunable-refractive index quarter wavelength-thickness polystyrene/poly(vinyl methyl ether) (PS/PVME) homopolymer blend backside antireflection coating (BARC) that alleviates this issue. The coating’s refractive index can be tuned from 1.47 to 1.6, drastically reducing reflections at the photoresist-substrate interface for substrates with refractive indices as low as 1.35 for normal incidence and even lower for angled illumination. By injecting the light through the substrate, and applying the antireflection layer to the top of the photoresist, interference lithography can even be performed on high refractive index substrates, such as ITO-coated glass. We demonstrate fabrication of hexagonal, face-centered cubic, and simple cubic lattices in SU-8 photoresist (refractive index of 1.59) using 532 nm laser light on non-index matched substrates including ITO-coated glass and borosilicate glass, and investigate the effects of reflection interference on the photonic bandstructure.

Authors:
 [1]; ORCiD logo [1]
  1. Univ. of Illinois at Urbana-Champaign, IL (United States)
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Light-Material Interactions in Energy Conversion (LMI)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1470418
Alternate Identifier(s):
OSTI ID: 1422426
Grant/Contract Number:  
SC0001293
Resource Type:
Accepted Manuscript
Journal Name:
Advanced Optical Materials
Additional Journal Information:
Journal Volume: 6; Journal Issue: 8; Related Information: LMI partners with California Institute of Technology (lead); Harvard University; University of Illinois, Urbana-Champaign; Lawrence Berkeley National Laboratory; Journal ID: ISSN 2195-1071
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; solar (photovoltaic); solid state lighting, phonons; thermal conductivity; electrodes - solar, materials and chemistry by design; optics; synthesis (novel materials); synthesis (self-assembly)

Citation Formats

Bacon-Brown, Daniel A., and Braun, Paul V. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. United States: N. p., 2018. Web. doi:10.1002/adom.201701049.
Bacon-Brown, Daniel A., & Braun, Paul V. Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography. United States. doi:10.1002/adom.201701049.
Bacon-Brown, Daniel A., and Braun, Paul V. Fri . "Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography". United States. doi:10.1002/adom.201701049. https://www.osti.gov/servlets/purl/1470418.
@article{osti_1470418,
title = {Tunable Antireflection Coating to Remove Index-Matching Requirement for Interference Lithography},
author = {Bacon-Brown, Daniel A. and Braun, Paul V.},
abstractNote = {Interference lithography is a flexible technique for creating 3D periodic nano- and micro-structures that can be used to make a wide variety of crystal lattices but, as we have found, some lattices require index-matched substrates to eliminate reflections at the photoresist-substrate interface. Here we present a tunable-refractive index quarter wavelength-thickness polystyrene/poly(vinyl methyl ether) (PS/PVME) homopolymer blend backside antireflection coating (BARC) that alleviates this issue. The coating’s refractive index can be tuned from 1.47 to 1.6, drastically reducing reflections at the photoresist-substrate interface for substrates with refractive indices as low as 1.35 for normal incidence and even lower for angled illumination. By injecting the light through the substrate, and applying the antireflection layer to the top of the photoresist, interference lithography can even be performed on high refractive index substrates, such as ITO-coated glass. We demonstrate fabrication of hexagonal, face-centered cubic, and simple cubic lattices in SU-8 photoresist (refractive index of 1.59) using 532 nm laser light on non-index matched substrates including ITO-coated glass and borosilicate glass, and investigate the effects of reflection interference on the photonic bandstructure.},
doi = {10.1002/adom.201701049},
journal = {Advanced Optical Materials},
number = 8,
volume = 6,
place = {United States},
year = {2018},
month = {2}
}

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