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Title: Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

Abstract

The use of a decal transfer lithography technique to fabricate elastomeric stamps with triangular cross-sections, specifically triangular prisms and cones, is described. These stamps are used in demonstrations for several prototypical optical applications, including the fabrication of multiheight 3D photoresist patterns with near zero-width features using near-field phase shift lithography, fabrication of periodic porous polymer structures by maskless proximity field nanopatterning, embossing thin-film antireflection coatings for improved device performance, and efficient fabrication of substrates for surface-enhanced Raman spectroscopic sensing. Furthermore, the applications illustrate the utility of the triangular poly(dimethylsiloxane) decals for a wide variety of optics-centric applications, particularly those that exploit the ability of the designed geometries and materials combinations to manipulate light–matter interactions in a predictable and controllable manner.

Authors:
 [1];  [1];  [2];  [1];  [3];  [1];  [4];  [1];  [1]
+ Show Author Affiliations
  1. Univ. of Illinois at Urbana-Champaign, IL (United States)
  2. Univ. of California, Berkeley, CA (United States)
  3. U.S. Navy NAVAIR-NAWCWD, China Lake, CA (United States)
  4. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Publication Date:
Research Org.:
Univ. of Illinois at Urbana-Champaign, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division
OSTI Identifier:
1876583
Grant/Contract Number:  
FG02-07ER46471; FG02-07ER46453; SC0001293
Resource Type:
Accepted Manuscript
Journal Name:
Advanced Functional Materials
Additional Journal Information:
Journal Volume: 22; Journal Issue: 14; Journal ID: ISSN 1616-301X
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Bowen, Audrey M., Motala, Michael J., Lucas, J. Matthew, Gupta, Sidhartha, Baca, Alfred J., Mihi, Agustin, Alivisatos, A. Paul, Braun, Paul V., and Nuzzo, Ralph G. Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing. United States: N. p., 2012. Web. doi:10.1002/adfm.201102455.
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Bowen, Audrey M., Motala, Michael J., Lucas, J. Matthew, Gupta, Sidhartha, Baca, Alfred J., Mihi, Agustin, Alivisatos, A. Paul, Braun, Paul V., & Nuzzo, Ralph G. Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing. United States. https://doi.org/10.1002/adfm.201102455
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Bowen, Audrey M., Motala, Michael J., Lucas, J. Matthew, Gupta, Sidhartha, Baca, Alfred J., Mihi, Agustin, Alivisatos, A. Paul, Braun, Paul V., and Nuzzo, Ralph G. Thu . "Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing". United States. https://doi.org/10.1002/adfm.201102455. https://www.osti.gov/servlets/purl/1876583.
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@article{osti_1876583,
title = {Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing},
author = {Bowen, Audrey M. and Motala, Michael J. and Lucas, J. Matthew and Gupta, Sidhartha and Baca, Alfred J. and Mihi, Agustin and Alivisatos, A. Paul and Braun, Paul V. and Nuzzo, Ralph G.},
abstractNote = {The use of a decal transfer lithography technique to fabricate elastomeric stamps with triangular cross-sections, specifically triangular prisms and cones, is described. These stamps are used in demonstrations for several prototypical optical applications, including the fabrication of multiheight 3D photoresist patterns with near zero-width features using near-field phase shift lithography, fabrication of periodic porous polymer structures by maskless proximity field nanopatterning, embossing thin-film antireflection coatings for improved device performance, and efficient fabrication of substrates for surface-enhanced Raman spectroscopic sensing. Furthermore, the applications illustrate the utility of the triangular poly(dimethylsiloxane) decals for a wide variety of optics-centric applications, particularly those that exploit the ability of the designed geometries and materials combinations to manipulate light–matter interactions in a predictable and controllable manner.},
doi = {10.1002/adfm.201102455},
journal = {Advanced Functional Materials},
number = 14,
volume = 22,
place = {United States},
year = {Thu Apr 12 00:00:00 EDT 2012},
month = {Thu Apr 12 00:00:00 EDT 2012}
}
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https://doi.org/10.1002/adfm.201102455
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