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Title: Double sided grating fabrication for high energy X-ray phase contrast imaging

Abstract

State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. Furthermore, we have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.

Authors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1]
  1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1457363
Report Number(s):
[SAND-2018-0961J]
[Journal ID: ISSN 1369-8001; PII: S1369800118301756]
Grant/Contract Number:  
[AC04-94AL85000]
Resource Type:
Accepted Manuscript
Journal Name:
Materials Science in Semiconductor Processing
Additional Journal Information:
[ Journal Volume: 92; Journal Issue: 2019]; Journal ID: ISSN 1369-8001
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; XPCI; Silicon deep reactive ion etch; Front-to-back alignment; Gratings; Electrocoating; Conformal plating

Citation Formats

Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, and Dagel, Amber L. Double sided grating fabrication for high energy X-ray phase contrast imaging. United States: N. p., 2018. Web. doi:10.1016/j.mssp.2018.04.016.
Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, & Dagel, Amber L. Double sided grating fabrication for high energy X-ray phase contrast imaging. United States. doi:10.1016/j.mssp.2018.04.016.
Hollowell, Andrew E., Arrington, Christian L., Finnegan, Patrick, Musick, Kate, Resnick, Paul, Volk, Steve, and Dagel, Amber L. Thu . "Double sided grating fabrication for high energy X-ray phase contrast imaging". United States. doi:10.1016/j.mssp.2018.04.016. https://www.osti.gov/servlets/purl/1457363.
@article{osti_1457363,
title = {Double sided grating fabrication for high energy X-ray phase contrast imaging},
author = {Hollowell, Andrew E. and Arrington, Christian L. and Finnegan, Patrick and Musick, Kate and Resnick, Paul and Volk, Steve and Dagel, Amber L.},
abstractNote = {State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. Furthermore, we have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.},
doi = {10.1016/j.mssp.2018.04.016},
journal = {Materials Science in Semiconductor Processing},
number = [2019],
volume = [92],
place = {United States},
year = {2018},
month = {4}
}

Journal Article:
Free Publicly Available Full Text
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Figures / Tables:

Figure 1 Figure 1: Integration approach for front to back aligned XPCI gratings. (a) Align, pattern and etch front and backside alignment marks. (b) Etch topside Si grating and fill with oxide to support fragile Si bars. (c) Flip substrate, pattern and etch backside Si grating. (d) Selectively etch oxide. (e) Depositmore » conformal ALD Pt seed metal. (f) Precision electrodeposit Au on top of Pt seed.« less

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Figures/Tables have been extracted from DOE-funded journal article accepted manuscripts.