DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching

Authors:
; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1375484
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology B
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology B Journal Volume: 35 Journal Issue: 6; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society/AIP
Country of Publication:
United States
Language:
English

Citation Formats

Li, Kenan, Wojcik, Michael J., Divan, Ralu, Ocola, Leonidas E., Shi, Bing, Rosenmann, Daniel, and Jacobsen, Chris. Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching. United States: N. p., 2017. Web. doi:10.1116/1.4991794.
Li, Kenan, Wojcik, Michael J., Divan, Ralu, Ocola, Leonidas E., Shi, Bing, Rosenmann, Daniel, & Jacobsen, Chris. Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching. United States. https://doi.org/10.1116/1.4991794
Li, Kenan, Wojcik, Michael J., Divan, Ralu, Ocola, Leonidas E., Shi, Bing, Rosenmann, Daniel, and Jacobsen, Chris. Thu . "Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching". United States. https://doi.org/10.1116/1.4991794.
@article{osti_1375484,
title = {Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching},
author = {Li, Kenan and Wojcik, Michael J. and Divan, Ralu and Ocola, Leonidas E. and Shi, Bing and Rosenmann, Daniel and Jacobsen, Chris},
abstractNote = {},
doi = {10.1116/1.4991794},
journal = {Journal of Vacuum Science and Technology B},
number = 6,
volume = 35,
place = {United States},
year = {Thu Aug 17 00:00:00 EDT 2017},
month = {Thu Aug 17 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1116/1.4991794

Citation Metrics:
Cited by: 20 works
Citation information provided by
Web of Science

Save / Share:

Works referenced in this record:

Metal-Assisted Chemical Etching of Silicon: A Review
journal, September 2010

  • Huang, Zhipeng; Geyer, Nadine; Werner, Peter
  • Advanced Materials, Vol. 23, Issue 2, p. 285-308
  • DOI: 10.1002/adma.201001784

Hard x-ray scanning imaging achieved with bonded multilayer Laue lenses
journal, January 2017

  • Huang, Xiaojing; Xu, Weihe; Nazaretski, Evgeny
  • Optics Express, Vol. 25, Issue 8
  • DOI: 10.1364/OE.25.008698

Vertical directionality-controlled metal-assisted chemical etching for ultrahigh aspect ratio nanoscale structures
journal, November 2014

  • Tiberio, Richard C.; Rooks, Michael J.; Chang, Chieh
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 32, Issue 6
  • DOI: 10.1116/1.4898199

Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating
journal, July 2010


Interlaced zone plate optics for hard X-ray imaging in the 10 nm range
journal, March 2017

  • Mohacsi, Istvan; Vartiainen, Ismo; Rösner, Benedikt
  • Scientific Reports, Vol. 7, Issue 1
  • DOI: 10.1038/srep43624

Zone-Doubling Technique to Produce Ultrahigh-Resolution X-Ray Optics
journal, December 2007


New diamond nanofabrication process for hard x-ray zone plates
journal, November 2011

  • Uhlén, Fredrik; Lindqvist, Sandra; Nilsson, Daniel
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 6
  • DOI: 10.1116/1.3656055

Silicon nanostructures from electroless electrochemical etching
journal, February 2005


Demonstration of 12 nm Resolution Fresnel Zone Plate Lens based Soft X-ray Microscopy
journal, January 2009

  • Chao, Weilun; Kim, Jihoon; Rekawa, Senajith
  • Optics Express, Vol. 17, Issue 20
  • DOI: 10.1364/OE.17.017669

Development characteristics of polymethyl methacrylate in alcohol/water mixtures: a lithography and Raman spectroscopy study
journal, December 2015


Advanced thin film technology for ultrahigh resolution X-ray microscopy
journal, October 2009


Porosity control in metal-assisted chemical etching of degenerately doped silicon nanowires
journal, July 2012


Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications
journal, January 2007

  • Feng, Yan; Feser, Michael; Lyon, Alan
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 6
  • DOI: 10.1116/1.2789447

High-efficiency multilevel zone plates for keV X-rays
journal, October 1999

  • Di Fabrizio, E.; Romanato, F.; Gentili, M.
  • Nature, Vol. 401, Issue 6756
  • DOI: 10.1038/44791

Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling
journal, April 2013

  • Mayer, Marcel; Keskinbora, Kahraman; Grévent, Corinne
  • Journal of Synchrotron Radiation, Vol. 20, Issue 3
  • DOI: 10.1107/S0909049513006602

Fabrication of Single-Crystalline Silicon Nanowires by Scratching a Silicon Surface with Catalytic Metal Particles
journal, February 2006

  • Peng, K. Q.; Hu, J. J.; Yan, Y. J.
  • Advanced Functional Materials, Vol. 16, Issue 3, p. 387-394
  • DOI: 10.1002/adfm.200500392

High aspect ratio silicon etch: A review
journal, September 2010

  • Wu, Banqiu; Kumar, Ajay; Pamarthy, Sharma
  • Journal of Applied Physics, Vol. 108, Issue 5
  • DOI: 10.1063/1.3474652

Zone plates with high efficiency in high orders of diffraction described by dynamical theory
journal, October 1997

  • Schneider, G.
  • Applied Physics Letters, Vol. 71, Issue 16
  • DOI: 10.1063/1.120069

Multilayer on-chip stacked Fresnel zone plates: Hard x-ray fabrication and soft x-ray simulations
journal, November 2015

  • Li, Kenan; Wojcik, Michael J.; Ocola, Leonidas E.
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 33, Issue 6
  • DOI: 10.1116/1.4935252

CASINO V2.42—A Fast and Easy-to-use Modeling Tool for Scanning Electron Microscopy and Microanalysis Users
journal, January 2007

  • Drouin, Dominique; Couture, Alexandre Réal; Joly, Dany
  • Scanning, Vol. 29, Issue 3
  • DOI: 10.1002/sca.20000

Coupled wave description of the diffraction by zone plates with high aspect ratios
journal, May 1992


Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography
journal, June 2010


Metal-assisted chemical etching in HF/H2O2 produces porous silicon
journal, October 2000

  • Li, X.; Bohn, P. W.
  • Applied Physics Letters, Vol. 77, Issue 16
  • DOI: 10.1063/1.1319191

Efficient concentration of high-energy x-rays for diffraction-limited imaging resolution
journal, January 2017


Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics
journal, June 2014

  • Chang, Chieh; Sakdinawat, Anne
  • Nature Communications, Vol. 5, Issue 1
  • DOI: 10.1038/ncomms5243

Fresnel zone plate stacking in the intermediate field for high efficiency focusing in the hard X-ray regime
journal, January 2014

  • Gleber, Sophie-Charlotte; Wojcik, Michael; Liu, Jie
  • Optics Express, Vol. 22, Issue 23
  • DOI: 10.1364/OE.22.028142

Ultra-high resolution zone-doubled 
diffractive X-ray optics for the multi-keV regime
journal, December 2010

  • Vila-Comamala, Joan; Gorelick, Sergey; Färm, Elina
  • Optics Express, Vol. 19, Issue 1
  • DOI: 10.1364/OE.19.000175