skip to main content

DOE PAGESDOE PAGES

Title: Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching

Authors:
; ; ; ; ; ;
Publication Date:
Grant/Contract Number:
AC02-06CH11357
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics Journal Volume: 35 Journal Issue: 6; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society/AIP
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1375484

Li, Kenan, Wojcik, Michael J., Divan, Ralu, Ocola, Leonidas E., Shi, Bing, Rosenmann, Daniel, and Jacobsen, Chris. Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching. United States: N. p., Web. doi:10.1116/1.4991794.
Li, Kenan, Wojcik, Michael J., Divan, Ralu, Ocola, Leonidas E., Shi, Bing, Rosenmann, Daniel, & Jacobsen, Chris. Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching. United States. doi:10.1116/1.4991794.
Li, Kenan, Wojcik, Michael J., Divan, Ralu, Ocola, Leonidas E., Shi, Bing, Rosenmann, Daniel, and Jacobsen, Chris. 2017. "Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching". United States. doi:10.1116/1.4991794.
@article{osti_1375484,
title = {Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching},
author = {Li, Kenan and Wojcik, Michael J. and Divan, Ralu and Ocola, Leonidas E. and Shi, Bing and Rosenmann, Daniel and Jacobsen, Chris},
abstractNote = {},
doi = {10.1116/1.4991794},
journal = {Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics},
number = 6,
volume = 35,
place = {United States},
year = {2017},
month = {8}
}