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Title: Tunable hard x-ray nanofocusing with Fresnel zone plates fabricated using deep etching

Abstract

Fresnel zone plates are used widely for x-ray nanofocusing, due to their ease of alignment and energy tunability. Their spatial resolution is limited in part by their outermost zone width drN, while their efficiency is limited in part by their thickness tzp. We demonstrate the use of Fresnel zone plate optics for x-ray nanofocusing with drN = 16 nm outermost zone width and a thickness of about tzp = 1.8 μm (or an aspect ratio of 110) with an absolute focusing efficiency of 4.7% at 12 keV, and 6.2% at 10 keV. Using partially coherent illumination at 12 keV, the zone plate delivered a FWHM focus of 46 X 60 nm at 12 keV, with the first-order coherent mode in a ptychographic reconstruction showing a probe size of 16 nm FWHM. These optics were fabricated using a combination of metal-assisted chemical etching and atomic layer deposition for the diffracting structures, and silicon wafer back-thinning to produce optics useful for real applications. This approach should enable new higher resolution views of thick materials, especially when energy tunability is required.

Authors:
ORCiD logo; ; ; ; ; ; ; ; ; ORCiD logo
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States); Brookhaven National Lab. (BNL), Upton, NY (United States); SLAC National Accelerator Lab., Menlo Park, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1616218
Alternate Identifier(s):
OSTI ID: 1616271; OSTI ID: 1616942; OSTI ID: 1638148
Report Number(s):
BNL-215880-2020-JAAM
Journal ID: ISSN 2334-2536
Grant/Contract Number:  
AC02-06CH11357; SC0012704; R01-MH115265; AC02-76SF00515
Resource Type:
Published Article
Journal Name:
Optica
Additional Journal Information:
Journal Name: Optica Journal Volume: 7 Journal Issue: 5; Journal ID: ISSN 2334-2536
Publisher:
Optical Society of America
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Li, Kenan, Ali, Sajid, Wojcik, Michael, De Andrade, Vincent, Huang, Xiaojing, Yan, Hanfei, Chu, Yong S., Nazaretski, Evgeny, Pattammattel, Ajith, and Jacobsen, Chris. Tunable hard x-ray nanofocusing with Fresnel zone plates fabricated using deep etching. United States: N. p., 2020. Web. doi:10.1364/OPTICA.387445.
Li, Kenan, Ali, Sajid, Wojcik, Michael, De Andrade, Vincent, Huang, Xiaojing, Yan, Hanfei, Chu, Yong S., Nazaretski, Evgeny, Pattammattel, Ajith, & Jacobsen, Chris. Tunable hard x-ray nanofocusing with Fresnel zone plates fabricated using deep etching. United States. doi:https://doi.org/10.1364/OPTICA.387445
Li, Kenan, Ali, Sajid, Wojcik, Michael, De Andrade, Vincent, Huang, Xiaojing, Yan, Hanfei, Chu, Yong S., Nazaretski, Evgeny, Pattammattel, Ajith, and Jacobsen, Chris. Wed . "Tunable hard x-ray nanofocusing with Fresnel zone plates fabricated using deep etching". United States. doi:https://doi.org/10.1364/OPTICA.387445.
@article{osti_1616218,
title = {Tunable hard x-ray nanofocusing with Fresnel zone plates fabricated using deep etching},
author = {Li, Kenan and Ali, Sajid and Wojcik, Michael and De Andrade, Vincent and Huang, Xiaojing and Yan, Hanfei and Chu, Yong S. and Nazaretski, Evgeny and Pattammattel, Ajith and Jacobsen, Chris},
abstractNote = {Fresnel zone plates are used widely for x-ray nanofocusing, due to their ease of alignment and energy tunability. Their spatial resolution is limited in part by their outermost zone width drN, while their efficiency is limited in part by their thickness tzp. We demonstrate the use of Fresnel zone plate optics for x-ray nanofocusing with drN = 16 nm outermost zone width and a thickness of about tzp = 1.8 μm (or an aspect ratio of 110) with an absolute focusing efficiency of 4.7% at 12 keV, and 6.2% at 10 keV. Using partially coherent illumination at 12 keV, the zone plate delivered a FWHM focus of 46 X 60 nm at 12 keV, with the first-order coherent mode in a ptychographic reconstruction showing a probe size of 16 nm FWHM. These optics were fabricated using a combination of metal-assisted chemical etching and atomic layer deposition for the diffracting structures, and silicon wafer back-thinning to produce optics useful for real applications. This approach should enable new higher resolution views of thick materials, especially when energy tunability is required.},
doi = {10.1364/OPTICA.387445},
journal = {Optica},
number = 5,
volume = 7,
place = {United States},
year = {2020},
month = {4}
}

Journal Article:
Free Publicly Available Full Text
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DOI: https://doi.org/10.1364/OPTICA.387445

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