Search Menu
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information
Search Scholarly Publications

Title: Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques

Abstract

Plasma-assisted atomic layer deposition (ALD) is used for the deposition of environmental barriers directly onto organic photovoltaic devices (OPVs) at near room temperature (30 °C). To study the effect of the ALD process on the organic materials forming the device, the precursor diffusion and intermixing at the interface during the growth of different plasma-assisted ALD inorganic barriers (i.e. Al2O3 and TiO2) onto the organic photoactive layer (P3HT:ICBA) was investigated in this paper. Depth profile x-ray photoelectron spectroscopy was used to analyze the composition of the organic/inorganic interface to investigate the infiltration of the plasma-assisted ALD precursors into the photoactive layer as a function of the precursor dimension, the process temperature, and organic layer morphology. The free volume in the photoactive layer accessible to the ALD precursor was characterized by means of ellipsometric porosimetry (EP) and spectroscopic ellipsometry as a function of temperature. The organic layer is shown to exhibit free volume broadening at high temperatures, increasing the infiltration depth of the ALD precursor into the photoactive layer. Furthermore, based on previous investigations, the intrinsic permeation properties of the inorganic layers deposited by plasma-assisted ALD were predicted from the nano-porosity content as measured by EP and found to be in themore » 10-6 gm-2 d-1 range. Insight from our studies was used to design and fabricate multilayer barriers synthesized at near-room temperature by plasma-assisted ALD in combination with plasma-enhanced CVD onto organic photovoltaic (OPVs) devices. Finally, encapsulated OPVs displayed shelf-lifetimes up to 1400 h at ambient conditions.« less

Authors:
 [1];  [2];  [2];  [2];  [3];  [4]
+ Show Author Affiliations
  1. Eindhoven Univ. of Technology (Netherlands). Dept. of Applied Physics; Dutch Polymer Inst. (DPI), Eindhoven (Netherlands)
  2. Georgia Inst. of Technology, Atlanta, GA (United States). Center for Organic Photonics and Electronics (COPE). School of Electrical and Computer Engineering
  3. Eindhoven Univ. of Technology (Netherlands). Dept. of Applied Physics; Solar Research SOLLIANCE, Eindhoven (Netherlands)
  4. Georgia Inst. of Technology, Atlanta, GA (United States). George W. Woodruff School of Mechanical Engineering. School of Materials Science and Engineering
Publication Date:
Research Org.:
Georgia Institute of Technology, Atlanta, GA (United States); Eindhoven Univ. of Technology (Netherlands)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA), Office of Defense Nuclear Nonproliferation; USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office; Office of Naval Research (ONR) (United States)
OSTI Identifier:
1438215
Alternate Identifier(s):
OSTI ID: 1334210
Grant/Contract Number:  
NA0002576; EE0004946; N00014-14-1-0580; N00014-16-1-2520; N00014-04-1-0313
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Physics. D, Applied Physics
Additional Journal Information:
Journal Volume: 50; Journal Issue: 2; Journal ID: ISSN 0022-3727
Publisher:
IOP Publishing
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY

Citation Formats

Perrotta, Alberto, Fuentes-Hernandez, Canek, Khan, Talha M., Kippelen, Bernard, Creatore, Mariadriana, and Graham, Samuel. Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques. United States: N. p., 2016. Web. doi:10.1088/1361-6463/50/2/024003.
Copy to clipboard
Perrotta, Alberto, Fuentes-Hernandez, Canek, Khan, Talha M., Kippelen, Bernard, Creatore, Mariadriana, & Graham, Samuel. Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques. United States. https://doi.org/10.1088/1361-6463/50/2/024003
Copy to clipboard
Perrotta, Alberto, Fuentes-Hernandez, Canek, Khan, Talha M., Kippelen, Bernard, Creatore, Mariadriana, and Graham, Samuel. Fri . "Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques". United States. https://doi.org/10.1088/1361-6463/50/2/024003. https://www.osti.gov/servlets/purl/1438215.
Copy to clipboard
@article{osti_1438215,
title = {Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques},
author = {Perrotta, Alberto and Fuentes-Hernandez, Canek and Khan, Talha M. and Kippelen, Bernard and Creatore, Mariadriana and Graham, Samuel},
abstractNote = {Plasma-assisted atomic layer deposition (ALD) is used for the deposition of environmental barriers directly onto organic photovoltaic devices (OPVs) at near room temperature (30 °C). To study the effect of the ALD process on the organic materials forming the device, the precursor diffusion and intermixing at the interface during the growth of different plasma-assisted ALD inorganic barriers (i.e. Al2O3 and TiO2) onto the organic photoactive layer (P3HT:ICBA) was investigated in this paper. Depth profile x-ray photoelectron spectroscopy was used to analyze the composition of the organic/inorganic interface to investigate the infiltration of the plasma-assisted ALD precursors into the photoactive layer as a function of the precursor dimension, the process temperature, and organic layer morphology. The free volume in the photoactive layer accessible to the ALD precursor was characterized by means of ellipsometric porosimetry (EP) and spectroscopic ellipsometry as a function of temperature. The organic layer is shown to exhibit free volume broadening at high temperatures, increasing the infiltration depth of the ALD precursor into the photoactive layer. Furthermore, based on previous investigations, the intrinsic permeation properties of the inorganic layers deposited by plasma-assisted ALD were predicted from the nano-porosity content as measured by EP and found to be in the 10-6 gm-2 d-1 range. Insight from our studies was used to design and fabricate multilayer barriers synthesized at near-room temperature by plasma-assisted ALD in combination with plasma-enhanced CVD onto organic photovoltaic (OPVs) devices. Finally, encapsulated OPVs displayed shelf-lifetimes up to 1400 h at ambient conditions.},
doi = {10.1088/1361-6463/50/2/024003},
journal = {Journal of Physics. D, Applied Physics},
number = 2,
volume = 50,
place = {United States},
year = {Fri Dec 02 00:00:00 EST 2016},
month = {Fri Dec 02 00:00:00 EST 2016}
}
Copy to clipboard
Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1088/1361-6463/50/2/024003
Copyright Statement
Other availability
Search WorldCat Search WorldCat to find libraries that may hold this journal
Citation Metrics:
Cited by: 10 works
Citation information provided by
Web of Science
Save / Share:
Export Metadata
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.

Works referenced in this record:

Material challenge for flexible organic devices
journal, April 2006

Recent progress on thin-film encapsulation technologies for organic electronic devices
journal, March 2016

On the intrinsic moisture permeation rate of remote microwave plasma-deposited silicon nitride layers
journal, May 2014

  • van Assche, Ferdinandus J. H.; Unnikrishnan, Sandeep; Michels, Jasper J.
  • Thin Solid Films, Vol. 558
  • DOI: 10.1016/j.tsf.2014.02.069

Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
journal, January 2015

High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings
journal, April 2013

Engineering the mechanical properties of ultrabarrier films grown by atomic layer deposition for the encapsulation of printed electronics
journal, August 2015

  • Bulusu, A.; Singh, A.; Wang, C. Y.
  • Journal of Applied Physics, Vol. 118, Issue 8
  • DOI: 10.1063/1.4928855

Characterization of reactively sputtered permeation barrier materials on polymer substrates
journal, July 2011

Permeability and corrosion in ZrO 2 /Al 2 O 3 nanolaminate and Al 2 O 3 thin films grown by atomic layer deposition on polymers
journal, July 2012

  • Carcia, Peter F.; McLean, Robert S.; Li, Zhigang G.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 4
  • DOI: 10.1116/1.4729447

Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
journal, September 2015

  • Andringa, Anne-Marije; Perrotta, Alberto; de Peuter, Koen
  • ACS Applied Materials & Interfaces, Vol. 7, Issue 40
  • DOI: 10.1021/acsami.5b06801

Low temperature temporal and spatial atomic layer deposition of TiO 2 films
journal, July 2015

  • Aghaee, Morteza; Maydannik, Philipp S.; Johansson, Petri
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 4
  • DOI: 10.1116/1.4922588

Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al 2 O 3 films and Al 2 O 3 /a-SiN x :H stacks
journal, January 2012

  • Keuning, W.; van de Weijer, P.; Lifka, H.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 1
  • DOI: 10.1116/1.3664762

Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition
journal, July 2009

  • Carcia, P. F.; McLean, R. S.; Groner, M. D.
  • Journal of Applied Physics, Vol. 106, Issue 2
  • DOI: 10.1063/1.3159639

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
journal, August 2006

  • Langereis, E.; Creatore, M.; Heil, S. B. S.
  • Applied Physics Letters, Vol. 89, Issue 8
  • DOI: 10.1063/1.2338776

High-Performance, Air-Stable, Low-Temperature Processed Semitransparent Perovskite Solar Cells Enabled by Atomic Layer Deposition
journal, July 2015

10.1: Invited Paper : Roll-to-Roll Manufacturing of Functional Substrates and Encapsulation Films for Organic Electronics: Technologies and Challenges
journal, June 2015

  • Fahlteich, John; Steiner, Cindy; Top, Michiel
  • SID Symposium Digest of Technical Papers, Vol. 46, Issue 1
  • DOI: 10.1002/sdtp.10301

Atomic layer deposited Al2O3 as a capping layer for polymer based transistors
journal, August 2007

Ultra-thin alumina layer encapsulation of bulk heterojunction organic photovoltaics for enhanced device lifetime
journal, January 2014

Improvement of the humidity stability of organic–inorganic perovskite solar cells using ultrathin Al2O3 layers prepared by atomic layer deposition
journal, January 2015

  • Dong, Xu; Fang, Xiang; Lv, Minghang
  • Journal of Materials Chemistry A, Vol. 3, Issue 10, p. 5360-5367
  • DOI: 10.1039/C4TA06128D

Scratch resistance and durability enhancement of bulk heterojunction organic photovoltaics using ultra-thin alumina layers
journal, September 2014

  • Clark, Michael D.; Maschmann, Matthew R.; Patel, Romesh J.
  • Solar Energy Materials and Solar Cells, Vol. 128
  • DOI: 10.1016/j.solmat.2014.05.006

Encapsulation of organic solar cells with ultrathin barrier layers deposited by ozone-based atomic layer deposition
journal, December 2010

Thin-film encapsulation of polymer-based bulk-heterojunction photovoltaic cells by atomic layer deposition
journal, November 2009

A hybrid encapsulation method for organic electronics
journal, April 2009

  • Kim, N.; Potscavage, W. J.; Domercq, B.
  • Applied Physics Letters, Vol. 94, Issue 16
  • DOI: 10.1063/1.3115144

Encapsulation of pentacene/C60 organic solar cells with Al2O3 deposited by atomic layer deposition
journal, June 2007

  • Potscavage, W. J.; Yoo, S.; Domercq, B.
  • Applied Physics Letters, Vol. 90, Issue 25
  • DOI: 10.1063/1.2751108

Thin-film encapsulation of inverted indium-tin-oxide-free polymer solar cells by atomic layer deposition with improvement on stability and efficiency
journal, December 2012

  • Li, Kan; Fan, Huanhuan; Huang, Chaofan
  • Applied Physics Letters, Vol. 101, Issue 23
  • DOI: 10.1063/1.4769355

Nucleation and Growth during Al 2 O 3 Atomic Layer Deposition on Polymers
journal, November 2005

  • Wilson, C. A.; Grubbs, R. K.; George, S. M.
  • Chemistry of Materials, Vol. 17, Issue 23
  • DOI: 10.1021/cm050704d

Surface and sub-surface reactions during low temperature aluminium oxide atomic layer deposition on fiber-forming polymers
journal, January 2010

  • Spagnola, Joseph C.; Gong, Bo; Arvidson, Sara A.
  • Journal of Materials Chemistry, Vol. 20, Issue 20
  • DOI: 10.1039/c0jm00355g

Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers
journal, June 2010

  • Jur, Jesse S.; Spagnola, Joseph C.; Lee, Kyoungmi
  • Langmuir, Vol. 26, Issue 11
  • DOI: 10.1021/la904604z

On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
journal, April 2014

Ellipsometric Porosimetry and Electrochemical Impedance Spectroscopy Characterization for Moisture Permeation Barrier Layers: EP and EIS on Permeation Barriers
journal, July 2015

  • Perrotta, Alberto; García, Santiago J.; Creatore, Mariadriana
  • Plasma Processes and Polymers, Vol. 12, Issue 9
  • DOI: 10.1002/ppap.201500084

Determination of pore size distribution in thin films by ellipsometric porosimetry
journal, January 2000

  • Baklanov, M. R.; Mogilnikov, K. P.; Polovinkin, V. G.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, Issue 3
  • DOI: 10.1116/1.591390

Analysis of Nanoporosity in Moisture Permeation Barrier Layers by Electrochemical Impedance Spectroscopy
journal, July 2015

  • Perrotta, Alberto; García, Santiago J.; Michels, Jasper J.
  • ACS Applied Materials & Interfaces, Vol. 7, Issue 29
  • DOI: 10.1021/acsami.5b04060

Effect of Polymer Microstructure on the Nucleation Behavior of Alumina via Atomic Layer Deposition
journal, July 2014

  • Padbury, Richard P.; Jur, Jesse S.
  • The Journal of Physical Chemistry C, Vol. 118, Issue 32
  • DOI: 10.1021/jp506456y

Temperature-Dependent Infiltration of Polymers during Sequential Exposures to Trimethylaluminum
journal, July 2014

  • Padbury, Richard P.; Jur, Jesse S.
  • Langmuir, Vol. 30, Issue 30
  • DOI: 10.1021/la501679f

Plasma sealing of a low-K dielectric polymer
journal, October 2004

  • Martin Hoyas, A.; Schuhmacher, J.; Whelan, C. M.
  • Microelectronic Engineering, Vol. 76, Issue 1-4
  • DOI: 10.1016/j.mee.2004.07.024

Retardation of the surface rearrangement of O2 plasma-treated LDPE by a two-step temperature control
journal, January 2001

  • Kim, B. K.; Kim, K. S.; Cho, K.
  • Journal of Adhesion Science and Technology, Vol. 15, Issue 14
  • DOI: 10.1163/15685610152715791

A physicochemical study of oxygen plasma-modified polypropylene
journal, December 1995

  • Shahidzadeh-Ahmadi, N.; Chehimi, M. M.; Arefi-Khonsari, F.
  • Colloids and Surfaces A: Physicochemical and Engineering Aspects, Vol. 105, Issue 2-3
  • DOI: 10.1016/0927-7757(95)03314-9

In situ ellipsometry studies on swelling of thin polymer films: A review
journal, March 2015

Probing the Surface Swelling in Ultra-Thin Supported Polystyrene Films During Case II Diffusion of n-Hexane
journal, August 2013

  • Ogieglo, Wojciech; Wormeester, Herbert; Wessling, Matthias
  • Macromolecular Chemistry and Physics, Vol. 214, Issue 21
  • DOI: 10.1002/macp.201300371

n-Hexane induced swelling of thin PDMS films under non-equilibrium nanofiltration permeation conditions, resolved by spectroscopic ellipsometry
journal, March 2013

Effect of Sorbed Water and Temperature on the Optical Properties and Density of Thin Glassy Polymer Films on a Silicon Substrate
journal, April 2007

  • Rowe, Brandon W.; Freeman, Benny D.; Paul, Donald R.
  • Macromolecules, Vol. 40, Issue 8
  • DOI: 10.1021/ma0627931

Carbon Dioxide Sorption and Plasticization of Thin Glassy Polymer Films Tracked by Optical Methods
journal, March 2012

  • Horn, Norman R.; Paul, D. R.
  • Macromolecules, Vol. 45, Issue 6
  • DOI: 10.1021/ma300177k

Comparison of precursor infiltration into polymer thin films via atomic layer deposition and sequential vapor infiltration using in-situ quartz crystal microgravimetry
journal, July 2014

  • Padbury, Richard P.; Jur, Jesse S.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 32, Issue 4
  • DOI: 10.1116/1.4882654

Systematic study of trimethyl aluminum infiltration in polyethylene terephthalate and its effect on the mechanical properties of polyethylene terephthalate fibers
journal, January 2015

  • Padbury, Richard P.; Jur, Jesse S.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 1
  • DOI: 10.1116/1.4898435

Gas permeation in silicon-oxide/polymer (SiOx/PET) barrier films: role of the oxide lattice, nano-defects and macro-defects
journal, October 2002

Defect-permeation correlation for ultrathin transparent barrier coatings on polymers
journal, January 2000

  • da Silva Sobrinho, A. S.; Czeremuszkin, G.; Latrèche, M.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 18, Issue 1
  • DOI: 10.1116/1.582156

Morphology and gas barrier properties of thin SiO x coatings on polycarbonate: Correlations with plasma-enhanced chemical vapor deposition conditions
journal, March 2000

  • Erlat, Ahmet G.; Wang, Bo-Chy; Spontak, Richard J.
  • Journal of Materials Research, Vol. 15, Issue 3
  • DOI: 10.1557/JMR.2000.0103

The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain: The Mechanical Behavior of ALD-Polymer Hybrid
journal, January 2015

  • Bulusu, Anuradha; Graham, Samuel; Bahre, Hendrik
  • Advanced Engineering Materials, Vol. 17, Issue 7
  • DOI: 10.1002/adem.201400431

Stress Management in Thin-Film Gas-Permeation Barriers
journal, September 2015

  • Behrendt, Andreas; Meyer, Jens; van de Weijer, Peter
  • ACS Applied Materials & Interfaces, Vol. 8, Issue 6
  • DOI: 10.1021/acsami.5b11499

Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation
journal, January 2015

Flexible organic–inorganic hybrid layer encapsulation for organic opto-electronic devices
journal, March 2015

Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition
journal, March 2008

  • Dameron, Arrelaine A.; Davidson, Stephen D.; Burton, Beau B.
  • The Journal of Physical Chemistry C, Vol. 112, Issue 12
  • DOI: 10.1021/jp076866+

Al 2 O 3 and TiO 2 Atomic Layer Deposition on Copper for Water Corrosion Resistance
journal, November 2011

  • Abdulagatov, A. I.; Yan, Y.; Cooper, J. R.
  • ACS Applied Materials & Interfaces, Vol. 3, Issue 12
  • DOI: 10.1021/am2009579

Mechanisms of vapor permeation through multilayer barrier films: Lag time versus equilibrium permeation
journal, August 2004

  • Graff, G. L.; Williford, R. E.; Burrows, P. E.
  • Journal of Applied Physics, Vol. 96, Issue 4, p. 1840-1849
  • DOI: 10.1063/1.1768610

Ultra barrier flexible substrates for flat panel displays
journal, May 2001

The Role of Electron Affinity in Determining Whether Fullerenes Catalyze or Inhibit Photooxidation of Polymers for Solar Cells
journal, May 2012

  • Hoke, Eric T.; Sachs-Quintana, I. T.; Lloyd, Matthew T.
  • Advanced Energy Materials, Vol. 2, Issue 11
  • DOI: 10.1002/aenm.201200169
    Sort by:
    [ × clear filter / sort ]

    Works referencing / citing this record:

    Thickness-Dependent Swelling Behavior of Vapor-Deposited Smart Polymer Thin Films
    journal, November 2018

      Sort by:
      [ × clear filter / sort ]

      Similar Records in DOE PAGES and OSTI.GOV collections: