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Title: Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction

Abstract

Platinum–carbon deposits made via electron-beam-induced deposition were purified in this study via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ~485 K, and the purification rate is a function of the PtC5 thickness (80–360 nm) and laser pulse width (1–100 μs) in the ranges studied. The thickness dependence is attributed to the ~235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributed to the increased temperatures achieved at longer pulse widths. Finally, remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.

Authors:
 [1];  [1];  [1];  [2];  [3];  [4];  [5]
  1. Univ. of Tennessee, Knoxville, TN (United States)
  2. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
  3. Utah State Univ., Logan, UT (United States)
  4. Graz Univ. of Technology (Austria)
  5. Univ. of Tennessee, Knoxville, TN (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Publication Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1286840
Grant/Contract Number:  
AC05-00OR22725
Resource Type:
Accepted Manuscript
Journal Name:
ACS Applied Materials and Interfaces
Additional Journal Information:
Journal Volume: 6; Journal Issue: 23; Journal ID: ISSN 1944-8244
Publisher:
American Chemical Society (ACS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; annealing; focused electron-beam-induced deposition; nanofabrication; platinum; pulsed laser; purificationannealing; purification

Citation Formats

Stanford, Michael G., Lewis, Brett B., Noh, Joo Hyon, Fowlkes, Jason Davidson, Roberts, Nicholas A., Plank, Harald, and Rack, Philip D. Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction. United States: N. p., 2014. Web. doi:10.1021/am506246z.
Stanford, Michael G., Lewis, Brett B., Noh, Joo Hyon, Fowlkes, Jason Davidson, Roberts, Nicholas A., Plank, Harald, & Rack, Philip D. Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction. United States. https://doi.org/10.1021/am506246z
Stanford, Michael G., Lewis, Brett B., Noh, Joo Hyon, Fowlkes, Jason Davidson, Roberts, Nicholas A., Plank, Harald, and Rack, Philip D. Wed . "Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction". United States. https://doi.org/10.1021/am506246z. https://www.osti.gov/servlets/purl/1286840.
@article{osti_1286840,
title = {Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction},
author = {Stanford, Michael G. and Lewis, Brett B. and Noh, Joo Hyon and Fowlkes, Jason Davidson and Roberts, Nicholas A. and Plank, Harald and Rack, Philip D.},
abstractNote = {Platinum–carbon deposits made via electron-beam-induced deposition were purified in this study via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ~485 K, and the purification rate is a function of the PtC5 thickness (80–360 nm) and laser pulse width (1–100 μs) in the ranges studied. The thickness dependence is attributed to the ~235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributed to the increased temperatures achieved at longer pulse widths. Finally, remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.},
doi = {10.1021/am506246z},
journal = {ACS Applied Materials and Interfaces},
number = 23,
volume = 6,
place = {United States},
year = {Wed Nov 05 00:00:00 EST 2014},
month = {Wed Nov 05 00:00:00 EST 2014}
}

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Cited by: 42 works
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