MgO buffer layers on rolled nickel or copper as superconductor substrates
Abstract
Buffer layer architectures are epitaxially deposited on biaxially-textured rolled-Ni and/or Cu substrates for high current conductors, and more particularly buffer layer architectures such as MgO/Ag/Pt/Ni, MgO/Ag/Pd/Ni, MgO/Ag/Ni, MgO/Ag/Pd/Cu, MgO/Ag/Pt/Cu, and MgO/Ag/Cu. Techniques used to deposit these buffer layers include electron beam evaporation, thermal evaporation, rf magnetron sputtering, pulsed laser deposition, metal-organic chemical vapor deposition (MOCVD), combustion CVD, and spray pyrolysis.
- Inventors:
-
- Knoxville, TN
- (Andersonville, TN)
- Issue Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- OSTI Identifier:
- 873857
- Patent Number(s):
- 6261704
- Assignee:
- UT-Battelle, LLC (Oak Ridge, TN)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- DOE Contract Number:
- AC05-96OR22464
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- mgo; buffer; layers; rolled; nickel; copper; superconductor; substrates; layer; architectures; epitaxially; deposited; biaxially-textured; rolled-ni; cu; current; conductors; particularly; pd; techniques; deposit; electron; beam; evaporation; thermal; rf; magnetron; sputtering; pulsed; laser; deposition; metal-organic; chemical; vapor; mocvd; combustion; cvd; spray; pyrolysis; magnetron sputter; rf magnetron; current conductor; current conductors; magnetron sputtering; epitaxially deposited; buffer layer; chemical vapor; electron beam; vapor deposition; pulsed laser; layer architectures; buffer layers; laser deposition; biaxially-textured rolled; spray pyrolysis; particularly buffer; metal-organic chemical; thermal evaporation; superconductor substrates; combustion cvd; rolled nickel; organic chemical; beam evaporation; /428/
Citation Formats
Paranthaman, Mariappan, Goyal, Amit, Kroeger, Donald M, and List, III, Frederic A. MgO buffer layers on rolled nickel or copper as superconductor substrates. United States: N. p., 2001.
Web.
Paranthaman, Mariappan, Goyal, Amit, Kroeger, Donald M, & List, III, Frederic A. MgO buffer layers on rolled nickel or copper as superconductor substrates. United States.
Paranthaman, Mariappan, Goyal, Amit, Kroeger, Donald M, and List, III, Frederic A. Mon .
"MgO buffer layers on rolled nickel or copper as superconductor substrates". United States. https://www.osti.gov/servlets/purl/873857.
@article{osti_873857,
title = {MgO buffer layers on rolled nickel or copper as superconductor substrates},
author = {Paranthaman, Mariappan and Goyal, Amit and Kroeger, Donald M and List, III, Frederic A.},
abstractNote = {Buffer layer architectures are epitaxially deposited on biaxially-textured rolled-Ni and/or Cu substrates for high current conductors, and more particularly buffer layer architectures such as MgO/Ag/Pt/Ni, MgO/Ag/Pd/Ni, MgO/Ag/Ni, MgO/Ag/Pd/Cu, MgO/Ag/Pt/Cu, and MgO/Ag/Cu. Techniques used to deposit these buffer layers include electron beam evaporation, thermal evaporation, rf magnetron sputtering, pulsed laser deposition, metal-organic chemical vapor deposition (MOCVD), combustion CVD, and spray pyrolysis.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}
Works referenced in this record:
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