Device for providing high-intensity ion or electron beam
Abstract
A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work-function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.
- Inventors:
-
- Richland, WA
- Issue Date:
- Research Org.:
- Battelle Memorial Institute, Columbus, OH (United States)
- OSTI Identifier:
- 862916
- Patent Number(s):
- 4046666
- Assignee:
- United States of America as represented by United States Energy (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC06-76RL01830
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- device; providing; high-intensity; electron; beam; film; low-thermionic-work-function; material; maintained; cathode; producing; high-current; low-pressure; gas; discharge; means; sputter; deposition; auxiliary; electrode; surface; low-work-function; thorium; uranium; plutonium; rare; earth; elements; facing; disposition; electrical; potential; extract; continuously; replenishing; thermionic; emissions; plasmas; realized; extended; operating; periods; low-pressure gas; auxiliary electrode; sputter deposition; earth elements; electrical potential; pressure gas; electron beam; rare earth; gas discharge; earth element; thermionic emission; extended operating; sputter deposit; /204/313/314/
Citation Formats
McClanahan, Edwin D, and Moss, Ronald W. Device for providing high-intensity ion or electron beam. United States: N. p., 1977.
Web.
McClanahan, Edwin D, & Moss, Ronald W. Device for providing high-intensity ion or electron beam. United States.
McClanahan, Edwin D, and Moss, Ronald W. Sat .
"Device for providing high-intensity ion or electron beam". United States. https://www.osti.gov/servlets/purl/862916.
@article{osti_862916,
title = {Device for providing high-intensity ion or electron beam},
author = {McClanahan, Edwin D and Moss, Ronald W},
abstractNote = {A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work-function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 1977},
month = {Sat Jan 01 00:00:00 EST 1977}
}
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