Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

Hawryluk, Andrew M; Ceglio, Natale M

Title: Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

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Abstract

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.

Inventors:

Hawryluk, Andrew M ^[1]; Ceglio, Natale M ^[2]

Modesto, CA
Livermore, CA

Issue Date:: 1993-01-01

Research Org.:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

OSTI Identifier:: 868632

Patent Number(s):: 5178974

Assignee:: United States of America as represented by United States (Washington, DC)

Patent Classifications (CPCs):: G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/70433 - {Layout for increasing efficiency, for compensating imaging errors, e.g. layout of exposure fields,
G03F7/70233 - {Optical aspects of catoptric systems}
G03F7/70208 - {Multiple illumination paths, e.g. radiation distribution device, multiplexer, demultiplexer for single or multiple projection systems}
G03F7/2002 - {with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing
G03F7/70275 - {Multiple projection paths, array of projection systems, microlens projection systems, tandem projection systems}

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DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: virtually; distortion-free; imaging; field; resolution; lithography; electrons; particle; beams; distortion; free; performed; contains; curvature; reticle; imaged; direction; optical; form; encoded; mask; wafer; positioned; position; including; neutral; particles; electromagnetic; radiation; neutral particle; neutral particles; particle beam; electromagnetic radiation; particle beams; resolution imaging; wafer positioned; resolution lithography; field distortion; distortion free; virtually distortion-free; virtually distortion; field curvature; distortion-free imaging; /430/355/

Citation Formats


                    Hawryluk, Andrew M, and Ceglio, Natale M. Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams.  United States: N. p., 1993. 
        Web.

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                    Hawryluk, Andrew M, & Ceglio, Natale M. Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams.  United States.

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                    Hawryluk, Andrew M, and Ceglio, Natale M. Fri .  
        "Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams".  United States.  https://www.osti.gov/servlets/purl/868632.

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@article{osti_868632,

  title        = {Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams},

  author       = {Hawryluk, Andrew M and Ceglio, Natale M},

  abstractNote = {Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1993},

  month        = {1}

}

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