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Title: Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

Abstract

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.

Inventors:
 [1];  [2]
  1. (Modesto, CA)
  2. (Livermore, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
868632
Patent Number(s):
5178974
Assignee:
United States of America as represented by United States (Washington, DC) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
virtually; distortion-free; imaging; field; resolution; lithography; electrons; particle; beams; distortion; free; performed; contains; curvature; reticle; imaged; direction; optical; form; encoded; mask; wafer; positioned; position; including; neutral; particles; electromagnetic; radiation; neutral particle; neutral particles; particle beam; electromagnetic radiation; particle beams; resolution imaging; wafer positioned; resolution lithography; field distortion; distortion free; virtually distortion-free; virtually distortion; field curvature; distortion-free imaging; /430/355/

Citation Formats

Hawryluk, Andrew M., and Ceglio, Natale M. Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams. United States: N. p., 1993. Web.
Hawryluk, Andrew M., & Ceglio, Natale M. Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams. United States.
Hawryluk, Andrew M., and Ceglio, Natale M. Fri . "Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams". United States. https://www.osti.gov/servlets/purl/868632.
@article{osti_868632,
title = {Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams},
author = {Hawryluk, Andrew M. and Ceglio, Natale M.},
abstractNote = {Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {1}
}

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