Dual wavelength negative imaging DLP-SLA system and method
Abstract
The present disclosure relates to a method for forming a three dimensional (3D) component from a photopolymer resin. The method may involve generating a first optical beam at a first wavelength, with the first optical beam causing polymerization of a photopolymerizable resist. A second optical beam is generated at a second wavelength, different from the first wavelength, which inhibits polymerization of the photopolymerizable resist. A device is used to receive the first and second optical beams and to generate therefrom corresponding separate first and second light patterns, respectively, where the first light pattern forms a first image on the photopolymerizable resist to cause polymerization of a first portion of the photopolymerizable resist, while the second light pattern forms a second image on the photopolymerizable resist and inhibits polymerization of a second portion of the photopolymerizable resist.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 2293967
- Patent Number(s):
- 11840018
- Application Number:
- 17/345,158
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 06/11/2021
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Moran, Bryan D. Dual wavelength negative imaging DLP-SLA system and method. United States: N. p., 2023.
Web.
Moran, Bryan D. Dual wavelength negative imaging DLP-SLA system and method. United States.
Moran, Bryan D. Tue .
"Dual wavelength negative imaging DLP-SLA system and method". United States. https://www.osti.gov/servlets/purl/2293967.
@article{osti_2293967,
title = {Dual wavelength negative imaging DLP-SLA system and method},
author = {Moran, Bryan D.},
abstractNote = {The present disclosure relates to a method for forming a three dimensional (3D) component from a photopolymer resin. The method may involve generating a first optical beam at a first wavelength, with the first optical beam causing polymerization of a photopolymerizable resist. A second optical beam is generated at a second wavelength, different from the first wavelength, which inhibits polymerization of the photopolymerizable resist. A device is used to receive the first and second optical beams and to generate therefrom corresponding separate first and second light patterns, respectively, where the first light pattern forms a first image on the photopolymerizable resist to cause polymerization of a first portion of the photopolymerizable resist, while the second light pattern forms a second image on the photopolymerizable resist and inhibits polymerization of a second portion of the photopolymerizable resist.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 12 00:00:00 EST 2023},
month = {Tue Dec 12 00:00:00 EST 2023}
}
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