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Title: Dual wavelength negative imaging DLP-SLA system

Abstract

The present disclosure relates to a digital light projector (DLP) system which has first and second light sources. The first optical source may generate a first beam at a first wavelength which causes polymerization of a photopolymerizable resist. The second optical source may generate a second beam at a second wavelength different from the first wavelength, and where the second beam inhibits polymerization of the photopolymerizable resist. A digital micromirror device (DMD) is included which has a plurality of micromirrors and is configured to be illuminated by the first and second beams and to generate a pattern on the micromirrors which has light from the first and second light wavelengths controlled by the micromirror position. The first light image causes polymerization of a first portion of the photopolymerizable resist, while the second image inhibits polymerization of a second portion of the photopolymerizable resist.

Inventors:
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1840486
Patent Number(s):
11130288
Application Number:
16/020,529
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
B - PERFORMING OPERATIONS B33 - ADDITIVE MANUFACTURING TECHNOLOGY B33Y - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 06/27/2018
Country of Publication:
United States
Language:
English

Citation Formats

Moran, Bryan D. Dual wavelength negative imaging DLP-SLA system. United States: N. p., 2021. Web.
Moran, Bryan D. Dual wavelength negative imaging DLP-SLA system. United States.
Moran, Bryan D. Tue . "Dual wavelength negative imaging DLP-SLA system". United States. https://www.osti.gov/servlets/purl/1840486.
@article{osti_1840486,
title = {Dual wavelength negative imaging DLP-SLA system},
author = {Moran, Bryan D.},
abstractNote = {The present disclosure relates to a digital light projector (DLP) system which has first and second light sources. The first optical source may generate a first beam at a first wavelength which causes polymerization of a photopolymerizable resist. The second optical source may generate a second beam at a second wavelength different from the first wavelength, and where the second beam inhibits polymerization of the photopolymerizable resist. A digital micromirror device (DMD) is included which has a plurality of micromirrors and is configured to be illuminated by the first and second beams and to generate a pattern on the micromirrors which has light from the first and second light wavelengths controlled by the micromirror position. The first light image causes polymerization of a first portion of the photopolymerizable resist, while the second image inhibits polymerization of a second portion of the photopolymerizable resist.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2021},
month = {9}
}

Works referenced in this record:

Dynamic modeling of superresolution photoinduced-inhibition nanolithography
journal, July 2012


Two-Wavelength, Photo-Initiation and Photo-Inhibition Competing for Selective Photo-Patterning of Hydrogel Porous Microstructures
journal, May 2018


Three-Dimensional Printing Apparatus and Three-Dimensional Printing Method
patent-application, April 2017


3-D Printing the History of Mechanisms
journal, October 2004


Stereolithographic models derived from X-ray computed tomography - Reproduction accuracy
journal, August 1997


Three Dimensional Printing Adhesion Reduction Using Photoinhibition
patent-application, March 2016


Feasibility of Design in Stereolithography
journal, September 1997


Super-resolution nanolithography in photoreduction polymers
conference, August 2011

  • Gu, Min; Li, Xiangping; Cao, Yaoyu
  • 2011 International Quantum Electronics Conference (IQEC) and Conference on Lasers and Electro-Optics (CLEO) Pacific Rim incorporating the Australasian Conference on Optics, Lasers and Spectroscopy and the Australian Conference on Optical Fibre Technology
  • https://doi.org/10.1109/IQEC-CLEO.2011.6194169

New photoresists for super-resolution photo-inhibition nanofabrication
conference, August 2011

  • Cao, Yaoyu; Gan, Zongsong; Jia, Baohua
  • 2011 International Quantum Electronics Conference (IQEC) and Conference on Lasers and Electro-Optics (CLEO) Pacific Rim incorporating the Australasian Conference on Optics, Lasers and Spectroscopy and the Australian Conference on Optical Fibre Technology
  • https://doi.org/10.1109/IQEC-CLEO.2011.6194019

Two-color photo-initiation/inhibition lithography
conference, February 2010


Photopolymer Materials and Processes for Advanced Technologies
journal, November 2013


On Stereolithography
journal, September 2012


Dynamic mask projection stereo micro lithography
patent-application, November 2005