Dual wavelength negative imaging DLP-SLA system
Abstract
The present disclosure relates to a digital light projector (DLP) system which has first and second light sources. The first optical source may generate a first beam at a first wavelength which causes polymerization of a photopolymerizable resist. The second optical source may generate a second beam at a second wavelength different from the first wavelength, and where the second beam inhibits polymerization of the photopolymerizable resist. A digital micromirror device (DMD) is included which has a plurality of micromirrors and is configured to be illuminated by the first and second beams and to generate a pattern on the micromirrors which has light from the first and second light wavelengths controlled by the micromirror position. The first light image causes polymerization of a first portion of the photopolymerizable resist, while the second image inhibits polymerization of a second portion of the photopolymerizable resist.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1840486
- Patent Number(s):
- 11130288
- Application Number:
- 16/020,529
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
B - PERFORMING OPERATIONS B33 - ADDITIVE MANUFACTURING TECHNOLOGY B33Y - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 06/27/2018
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Moran, Bryan D. Dual wavelength negative imaging DLP-SLA system. United States: N. p., 2021.
Web.
Moran, Bryan D. Dual wavelength negative imaging DLP-SLA system. United States.
Moran, Bryan D. Tue .
"Dual wavelength negative imaging DLP-SLA system". United States. https://www.osti.gov/servlets/purl/1840486.
@article{osti_1840486,
title = {Dual wavelength negative imaging DLP-SLA system},
author = {Moran, Bryan D.},
abstractNote = {The present disclosure relates to a digital light projector (DLP) system which has first and second light sources. The first optical source may generate a first beam at a first wavelength which causes polymerization of a photopolymerizable resist. The second optical source may generate a second beam at a second wavelength different from the first wavelength, and where the second beam inhibits polymerization of the photopolymerizable resist. A digital micromirror device (DMD) is included which has a plurality of micromirrors and is configured to be illuminated by the first and second beams and to generate a pattern on the micromirrors which has light from the first and second light wavelengths controlled by the micromirror position. The first light image causes polymerization of a first portion of the photopolymerizable resist, while the second image inhibits polymerization of a second portion of the photopolymerizable resist.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 28 00:00:00 EDT 2021},
month = {Tue Sep 28 00:00:00 EDT 2021}
}
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