Methods and apparatus for forming submicron patterns on films
Abstract
A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
- Inventors:
- Issue Date:
- Research Org.:
- Univ. Konstanz (Germany); University of Massachusetts, Boston, MA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531505
- Patent Number(s):
- 7014786
- Application Number:
- 10/144,961
- Assignee:
- Universitat Konstanz (DE); University of Massachusetts (Boston, MA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- FG02-96ER45612; DMR-9809365
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2002-05-14
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE
Citation Formats
Schaffer, Erik, Mlynek, Jurgen, Steiner, Ullrich, Thurn-Albrecht, Thomas, and Russell, Thomas P. Methods and apparatus for forming submicron patterns on films. United States: N. p., 2006.
Web.
Schaffer, Erik, Mlynek, Jurgen, Steiner, Ullrich, Thurn-Albrecht, Thomas, & Russell, Thomas P. Methods and apparatus for forming submicron patterns on films. United States.
Schaffer, Erik, Mlynek, Jurgen, Steiner, Ullrich, Thurn-Albrecht, Thomas, and Russell, Thomas P. Tue .
"Methods and apparatus for forming submicron patterns on films". United States. https://www.osti.gov/servlets/purl/1531505.
@article{osti_1531505,
title = {Methods and apparatus for forming submicron patterns on films},
author = {Schaffer, Erik and Mlynek, Jurgen and Steiner, Ullrich and Thurn-Albrecht, Thomas and Russell, Thomas P.},
abstractNote = {A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 21 00:00:00 EST 2006},
month = {Tue Mar 21 00:00:00 EST 2006}
}
Works referenced in this record:
Chemical etching of record patterns and the like
patent, March 1979
- Breeden, Arnold H.
- US Patent Document 4,144,300
Lithographically induced self-construction of polymer microstructures for resistless patterning
journal, August 1999
- Chou, Stephen Y.; Zhuang, Lei; Guo, Linjie
- Applied Physics Letters, Vol. 75, Issue 7
Method of Using a Compressible Die Member to Form Patterns on a Plastic Sheet Including the Use of a Liquid Plastisol and Dielectric Heating
patent, February 1974
- Farkas, Robert D.
- US Patent Document 3,791,906
Surface-induced structure formation of polymer blends on patterned substrates
journal, February 1998
- Böltau, Martin; Walheim, Stefan; Mlynek, Jürgen
- Nature, Vol. 391, Issue 6670, p. 877-879
NANOTECHNOLOGY:Patterning Plastic With Plentiful Pillars
journal, November 1999
- Service, R. F.
- Science, Vol. 286, Issue 5442
Method of manufacturing semiconductor devices having a resist patern coincident with gate electrode
patent, March 1994
- Shimazu, Katsuhiro
- US Patent Document 5,290,717
Process for patterning powders into thick layers
patent, October 1998
- Detig, Robert H.; Hendrickson, William A.
- US Patent Document 5,817,374
Electric field induced pattern formation in interfacial metal colloid films
journal, November 1993
- Aharoni-Hazan, I.; Efrima, S.; Deutsch, M.
- Physica A: Statistical Mechanics and its Applications, Vol. 200, Issue 1-4
Dispersion-Driven Morphology of Mechanically Confined Polymer Films
journal, February 1999
- Dalnoki-Veress, K.; Nickel, B. G.; Dutcher, J. R.
- Physical Review Letters, Vol. 82, Issue 7
Methods and apparatus for forming submicron patterns on films
patent, May 2002
- Schaffer, Erik; Mlynek, Jurgen; Steiner, Ullrich
- US Patent Document 6,391,217