Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method

Nishi, Mineo; Makishima, Hideo

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A - human necessities
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Title: Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method

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Abstract

A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.

Inventors:

Nishi, Mineo ^[1]; Makishima, Hideo ^[1]

Kitakyushu, JP

Issue Date:: 1996-01-01

Research Org.:: Battelle Memorial Institute, Columbus, OH (United States)

OSTI Identifier:: 870405

Patent Number(s):: 5514526

Assignee:: Mitsubishi Chemical Corporation (Tokyo, JP)

Patent Classifications (CPCs):: G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/091 - {characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement}
G03F7/70583 - {Speckle reduction, e.g. coherence control, amplitude/wavefront splitting}

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DOE Contract Number:: AC06-76RL01830

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: fluorine-containing; composition; forming; anti-reflection; film; resist; surface; pattern; formation; method; comprises; aqueous; solution; water; soluble; fluorine; compound; steps; coating; photoresist; substrate; above-mentioned; exposing; coated; form; specific; developing; provided; formed; easily; removed; rinsing; alkali; according; dimensional; accuracy; anti-reflection film; water soluble; aqueous solution; photoresist composition; pattern formation; method according; forming anti-reflection; resist surface; dimensional accuracy; /430/524/

Citation Formats


                    Nishi, Mineo, and Makishima, Hideo. Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method.  United States: N. p., 1996. 
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                    Nishi, Mineo, & Makishima, Hideo. Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method.  United States.

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                    Nishi, Mineo, and Makishima, Hideo. Mon .  
        "Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method".  United States.  https://www.osti.gov/servlets/purl/870405.

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@article{osti_870405,

  title        = {Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method},

  author       = {Nishi, Mineo and Makishima, Hideo},

  abstractNote = {A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1996},

  month        = {1}

}

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