Global to push GA events into
skip to main content

Title: Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method

A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.
 [1];  [1]
  1. (Kitakyushu, JP)
Issue Date:
OSTI Identifier:
Mitsubishi Chemical Corporation (Tokyo, JP) PNNL
Patent Number(s):
US 5514526
Contract Number:
Research Org:
Country of Publication:
United States
fluorine-containing; composition; forming; anti-reflection; film; resist; surface; pattern; formation; method; comprises; aqueous; solution; water; soluble; fluorine; compound; steps; coating; photoresist; substrate; above-mentioned; exposing; coated; form; specific; developing; provided; formed; easily; removed; rinsing; alkali; according; dimensional; accuracy; anti-reflection film; water soluble; aqueous solution; photoresist composition; pattern formation; method according; forming anti-reflection; resist surface; dimensional accuracy; /430/524/