Development of in situ, at-wavelength metrology for soft x-ray nano-focusing
Journal Article
·
· Nuclear Inst. and Methods in Physics Research, A
OSTI ID:991960
At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick-Baez (KB) mirror nano-focusing. We describe here details of the metrology beamline endstation, the at-wavelength tests, and an original alignment method that have already allowed us to precisely set a bendable KB mirror to achieve a FWHM focused spot size of ~;;120 nm, at 1-nm soft x-ray wavelength.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
- Sponsoring Organization:
- Advanced Light Source Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 991960
- Report Number(s):
- LBNL-3971E
- Journal Information:
- Nuclear Inst. and Methods in Physics Research, A, Journal Name: Nuclear Inst. and Methods in Physics Research, A
- Country of Publication:
- United States
- Language:
- English
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