At-wavelength Optical Metrology Development at the ALS
Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
- Sponsoring Organization:
- Advanced Light Source Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 985908
- Report Number(s):
- LBNL-3711E
- Country of Publication:
- United States
- Language:
- English
Similar Records
Development of in situ, at-wavelength metrology for soft x-ray nano-focusing
Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror
Related Subjects
77 NANOSCIENCE AND NANOTECHNOLOGY
ACCURACY
ADVANCED LIGHT SOURCE
ALIGNMENT
BENDING
BRIGHTNESS
DESIGN
FABRICATION
FEEDBACK
FREE ELECTRON LASERS
MIRRORS
OPTICS
PERFORMANCE
PRESERVATION
STABILIZATION
SYNCHROTRON RADIATION
at-wavelength
optical metrology
nano-focusing
mirror alignment
slope measurement
interferometer