N-TiO2 nanoparticles embedded in silica prepared by Ti ion implantation and annealing in nitrogen
Journal Article
·
· Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms, 268(9):1440-1445
Room temperature Ti ion implantation and subsequent thermal annealing in N2 ambience have been used to fabricate the anatase and rutile structured N-doped TiO2 particles embedded in the surface region of fused silica. The Stopping and Range of Ions in Matter (SRIM) code simulation indicates a Gaussian distribution of implanted Ti, with a projected range of 74.4 nm and straggling of 16.5 nm. However, Rutherford backscattering spectrometry and transmission electron microscopy results show a much shallower distribution peaked at ~ 30 nm. Significant sputtering loss of silica substrates has occurred during implantation. Nanoparticles with size of 10-20 nm in diameter have formed after implantation. X-ray photoelectron spectroscopy indicates the coexistence of TiO2 and metallic Ti in the as-implanted samples. Metallic Ti is oxidized to anatase TiO2 after annealing at 600ºC, while rutile TiO2 forms by phase transformation after annealing at 900ºC. At the same time, N-Ti-O, Ti-O-N and/or Ti-N-O linkages have formed in the lattice of TiO2. A red shift of 0.34 eV in the absorption edge is obtained for N-doped anatase TiO2 after annealing at 600 ºC for 6 h. The absorbance increases in the ultraviolet and visible waveband.
- Research Organization:
- Pacific Northwest National Laboratory (PNNL), Richland, WA (US), Environmental Molecular Sciences Laboratory (EMSL)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-76RL01830
- OSTI ID:
- 982305
- Report Number(s):
- PNNL-SA-70347; 25590; 34899; KC0201020
- Journal Information:
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms, 268(9):1440-1445, Journal Name: Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms, 268(9):1440-1445 Journal Issue: 9 Vol. 268; ISSN 0168-583X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
47 OTHER INSTRUMENTATION
ABSORPTION
ANNEALING
DISTRIBUTION
Environmental Molecular Sciences Laboratory
ION IMPLANTATION
IONS
MATTER
N-doped TiO2
NITROGEN
PARTICLES
PHASE TRANSFORMATIONS
RANGE
RED SHIFT
RUTHERFORD BACKSCATTERING SPECTROSCOPY
RUTILE
SILICA
SIMULATION
SPUTTERING
SUBSTRATES
SURFACES
TRANSMISSION ELECTRON MICROSCOPY
X-RAY PHOTOELECTRON SPECTROSCOPY
annealing
ion implantation
optical absorption
47 OTHER INSTRUMENTATION
ABSORPTION
ANNEALING
DISTRIBUTION
Environmental Molecular Sciences Laboratory
ION IMPLANTATION
IONS
MATTER
N-doped TiO2
NITROGEN
PARTICLES
PHASE TRANSFORMATIONS
RANGE
RED SHIFT
RUTHERFORD BACKSCATTERING SPECTROSCOPY
RUTILE
SILICA
SIMULATION
SPUTTERING
SUBSTRATES
SURFACES
TRANSMISSION ELECTRON MICROSCOPY
X-RAY PHOTOELECTRON SPECTROSCOPY
annealing
ion implantation
optical absorption