Low temperature front surface passivation of interdigitated back contact silicon heterojunction solar cell
Abstract
The interdigitated back contact silicon heterojunction (IBC-SHJ) solar cell requires a low temperature front surface passivation/anti-reflection structure. Conventional silicon surface passivation using SiO2 or a-SiNx is performed at temperature higher than 400°C, which is not suitable for the IBC-SHJ cell. In this paper, we propose a PECVD a-Si:H/a-SiNx:H/a-SiC:H stack structure to passivate the front surface of crystalline silicon at low temperature. The optical properties and passivation quality of this structure are characterized and solar cells using this structure are fabricated. With 2 nm a-Si:H layer, the stack structure exhibits stable passivation with effective minority carrier lifetime higher than 2 ms, and compatible with IBC-SHJ solar cell processing. A critical advantage of this structure is that the SiC allows it to be HF resistant, thus it can be deposited as the first step in the process. This protects the a-Si/c-Si interface and maintains a low surface recombination velocity.
- Authors:
- Publication Date:
- Research Org.:
- University of Delaware, Newark, DE
- Sponsoring Org.:
- USDOE Assistant Secretary for Energy Efficiency and Renewable Energy (EE); USDOE EERE Office of Solar Energy Technology (EE-2A)
- OSTI Identifier:
- 963899
- Report Number(s):
- DOE/GO/18077-2
TRN: US201110%%193
- DOE Contract Number:
- FG36-08GO18077
- Resource Type:
- Conference
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 14 SOLAR ENERGY; 36 MATERIALS SCIENCE; CARRIER LIFETIME; HETEROJUNCTIONS; OPTICAL PROPERTIES; PASSIVATION; PROCESSING; RECOMBINATION; SILICON; SOLAR CELLS; VELOCITY; back contact; silicon; heterojunction; solar cell
Citation Formats
Shu, Brent, Das, Ujjwal, Jani, Omkar, Hegedus, Steve, and Birkmire, Robert. Low temperature front surface passivation of interdigitated back contact silicon heterojunction solar cell. United States: N. p., 2009.
Web.
Shu, Brent, Das, Ujjwal, Jani, Omkar, Hegedus, Steve, & Birkmire, Robert. Low temperature front surface passivation of interdigitated back contact silicon heterojunction solar cell. United States.
Shu, Brent, Das, Ujjwal, Jani, Omkar, Hegedus, Steve, and Birkmire, Robert. 2009.
"Low temperature front surface passivation of interdigitated back contact silicon heterojunction solar cell". United States. https://www.osti.gov/servlets/purl/963899.
@article{osti_963899,
title = {Low temperature front surface passivation of interdigitated back contact silicon heterojunction solar cell},
author = {Shu, Brent and Das, Ujjwal and Jani, Omkar and Hegedus, Steve and Birkmire, Robert},
abstractNote = {The interdigitated back contact silicon heterojunction (IBC-SHJ) solar cell requires a low temperature front surface passivation/anti-reflection structure. Conventional silicon surface passivation using SiO2 or a-SiNx is performed at temperature higher than 400°C, which is not suitable for the IBC-SHJ cell. In this paper, we propose a PECVD a-Si:H/a-SiNx:H/a-SiC:H stack structure to passivate the front surface of crystalline silicon at low temperature. The optical properties and passivation quality of this structure are characterized and solar cells using this structure are fabricated. With 2 nm a-Si:H layer, the stack structure exhibits stable passivation with effective minority carrier lifetime higher than 2 ms, and compatible with IBC-SHJ solar cell processing. A critical advantage of this structure is that the SiC allows it to be HF resistant, thus it can be deposited as the first step in the process. This protects the a-Si/c-Si interface and maintains a low surface recombination velocity.},
doi = {},
url = {https://www.osti.gov/biblio/963899},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jun 08 00:00:00 EDT 2009},
month = {Mon Jun 08 00:00:00 EDT 2009}
}