In Situ Synchrotron Studies of ZnO Nanostructures During Electrochemical Deposition
Journal Article
·
· Curr.Appl.Phys.8:455-458,2008
OSTI ID:958642
ZnO nanostructured films fabricated by electrochemical deposition exhibit a variety of morphologies. Understanding their respective nucleation and growth mechanisms requires in situ techniques. A time-resolved X-ray absorption and fluorescence method is described, which adequately captures both processes and illustrates differences in the growth rates for films deposited at different potentials. In so doing, the new method has significant advantages over a previous method of continually scanning across the near-edge region of the absorption spectrum while the film was being deposited.
- Research Organization:
- Stanford Linear Accelerator Center (SLAC)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-76SF00515
- OSTI ID:
- 958642
- Report Number(s):
- SLAC-REPRINT-2009-047
- Journal Information:
- Curr.Appl.Phys.8:455-458,2008, Journal Name: Curr.Appl.Phys.8:455-458,2008 Journal Issue: 8 Vol. 3-4
- Country of Publication:
- United States
- Language:
- English
Similar Records
In Situ Synchrotron Studies of ZnO Nanostructures During Electrochemical Deposition
In Situ Synchrotron X-Ray Diffraction Experiments on Electrochemically Deposited ZnO Nanostructures
Direct Observation of Distinct Nucleation And Growth Processes in Electrochemically Deposited ZnO Nanostructures Using in Situ XANES
Journal Article
·
Mon Dec 31 23:00:00 EST 2007
· Current Applied Physics
·
OSTI ID:960164
In Situ Synchrotron X-Ray Diffraction Experiments on Electrochemically Deposited ZnO Nanostructures
Journal Article
·
Mon May 18 00:00:00 EDT 2009
· J. Phys. Chem. C112:14863,2008
·
OSTI ID:953124
Direct Observation of Distinct Nucleation And Growth Processes in Electrochemically Deposited ZnO Nanostructures Using in Situ XANES
Journal Article
·
Thu Apr 30 00:00:00 EDT 2009
· J.Phys.Chem.C112:2820-2824,2008
·
OSTI ID:958646