Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Direct Observation of Distinct Nucleation And Growth Processes in Electrochemically Deposited ZnO Nanostructures Using in Situ XANES

Journal Article · · J.Phys.Chem.C112:2820-2824,2008
OSTI ID:958646

In situ synchrotron X-ray absorption was used to study the nucleation and growth of ZnO nanostructures electrochemically deposited from aqueous solutions. A fixed-energy approach was used, which facilitates faster time resolution for systems that are not amenable to transmission measurements and where species-specific information has so far been elusive. Films formed at low potentials (?0.97 V vs Ag/AgCl) show instantaneous nucleation, continued growth, and coalescence of the nanorods. The resultant film is dense with narrow dispersion of rod diameters. At less negative deposition potentials (?0.77 V vs Ag/AgCl), the nucleation is more protracted, resulting in a polydispersed film. In this higher potential region, the growth rates are slower, and there is less evidence of coalescence in the deposited structures, with continued growth along the c-axis only.

Research Organization:
Stanford Linear Accelerator Center (SLAC)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-76SF00515
OSTI ID:
958646
Report Number(s):
SLAC-REPRINT-2009-043
Journal Information:
J.Phys.Chem.C112:2820-2824,2008, Journal Name: J.Phys.Chem.C112:2820-2824,2008 Journal Issue: 8 Vol. 112; ISSN 1932-7447
Country of Publication:
United States
Language:
English

Similar Records

Growth and characterization of ZnO nanostructure on TiO{sub 2}-ZnO films as a light scattering layer for dye sensitized solar cells
Journal Article · Tue Nov 14 23:00:00 EST 2017 · Materials Research Bulletin · OSTI ID:22730482

In Situ Synchrotron Studies of ZnO Nanostructures During Electrochemical Deposition
Journal Article · Mon May 11 00:00:00 EDT 2009 · Curr.Appl.Phys.8:455-458,2008 · OSTI ID:958642

In Situ Synchrotron Studies of ZnO Nanostructures During Electrochemical Deposition
Journal Article · Mon Dec 31 23:00:00 EST 2007 · Current Applied Physics · OSTI ID:960164