Self-Assembly of biologically inspired complex functional materials.
Nature combines hard and soft materials, often in hierarchical architectures, to get synergistic, optimized properties with proven, complex functionalities. Emulating such natural designs in robust engineering materials using efficient processing approaches represents a fundamental challenge to materials chemists. This presentation will review progress on understanding so-called 'evaporation-induced silica/surfactant self-assembly' (EISA) as a simple, general means to prepare porous thin-film nanostructures. Such porous materials are of interest for membranes, low-dielectric-constant (low-k) insulators, and even 'nano-valves' that open and close in response to an external stimulus. EISA can also be used to simultaneously organize hydrophilic and hydrophobic precursors into hybrid nanocomposites that are optically or chemically polymerizable, patternable, or adjustable. In constructing composite structures, a significant challenge is how to controllably organize or define multiple materials on multiple length scales. To address this challenge, we have combined sol-gel chemistry with molecular self-assembly in several evaporation-driven processing procedures collectively referred to as evaporation-induced self-assembly (EISA). EISA starts with a silica/water/surfactant system diluted with ethanol to create a homogeneous solution. We rely on ethanol and water evaporation during dip-coating (or other coating methods) to progressively concentrate surfactant and silica in the depositing film, driving micelle formation and subsequent continuous self-assembly of silica/surfactant thin film mesophases. One of the crucial aspects of this process, in terms of the sol-gel chemistry, is to work under conditions where the condensation rate of the hydrophilic silicic acid precursors (Si-OH) is minimized. The idea is to avoid gelation that would kinetically trap the system at an intermediate non-equilibrium state. We want the structure to self-assemble then solidify, with the addition of a siloxane condensation catalyst or by heating, to form the desired mesostructured product. Operating at an acidic pH (pH = 2) minimizes the condensation rate of silanols to form siloxanes Si-O-SiIn addition, hydrogen bonding and electrostatic interactions between silanols and hydrophilic surfactant head groups can further reduce the condensation rate. These combined factors maintain the depositing film in a fluid state, even beyond the point where ethanol and water are largely evaporated. This allows the deposited film to be self-healing and enables the use of virtually any evaporation-driven process (spin-coating, inkjet printing, or aerosol processing) to create ordered nanostructured films, patterns, or particles.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 951740
- Report Number(s):
- SAND2004-4364J; TRN: US200913%%110
- Journal Information:
- Proposed for publication in the Materials Research Society Bulletin., Journal Name: Proposed for publication in the Materials Research Society Bulletin.
- Country of Publication:
- United States
- Language:
- English
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