In-situ x-ray scattering study of continuous silica-surfactant self-assembly during steady-state dip coating.
Inorganic mesoporous thin-films are important for applications such as membranes, sensors, low-dielectric-constant insulators (so-called low {kappa} dielectrics), and fluidic devices. Over the past five years, several research groups have demonstrated the efficacy of using evaporation accompanying conventional coating operations such as spin- and dip-coating as an efficient means of driving the self-assembly of homogeneous solutions into highly ordered, oriented, mesostructured films. Understanding such evaporation-induced self-assembly (EISA) processes is of interest for both fundamental and technological reasons. Here, we use spatially resolved 2D grazing incidence X-ray scattering in combination with optical interferometry during steady-state dip-coating of surfactant-templated silica thin-films to structurally and compositionally characterize the EISA process. We report the evolution of a hexagonal (p6 mm) thin-film mesophase from a homogeneous precursor solution and its further structural development during drying and calcination. Monte Carlo simulations of water/ethanol/surfactant bulk phase behavior are used to investigate the role of ethanol in the self-assembly process, and we propose a mechanism to explain the observed dilation in unit cell dimensions during solvent evaporation.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS); Univ. of New Mexico; SNL
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-31-109-ENG-38
- OSTI ID:
- 15004598
- Journal Information:
- Journal of Physical Chemistry B: Materials, Surfaces, Interfaces, amp Biophysical, Vol. 107, Issue 31; Related Information: Aug. 7, 2003; ISSN 1089-5647
- Country of Publication:
- United States
- Language:
- ENGLISH
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