Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography.

Journal Article · Fri Aug 01 00:00:00 EDT 2008 · Proposed for publication in Applied Physics Letters.

OSTI ID:948684

Wiltzius, P ^[1]; Braun, P V ^[1]; Liao, H ^[1]; Brzezinski, A ^[1]; Chen, Y C ^[1]; Nelson, E ^[1]; Shir, D ^[1]; Rogers, J A ^[1]; Bogart, Katherine Huderle Andersen

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1. University of Illinois, Urbana-Champaign, Illinois

We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying geometries consistent with calculation. Spectroscopic measurements of transmission and reflection through the silicon and polymer structures reveal excellent optical properties, approaching properties predicted by simulations that assume ideal layouts.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 948684
• Report Number(s): SAND2008-5595J; TRN: US0901703
• Journal Information: Proposed for publication in Applied Physics Letters., Journal Name: Proposed for publication in Applied Physics Letters.
• Country of Publication: United States
• Language: English

Related Subjects

72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS
FABRICATION
OPTICAL PROPERTIES
PHOTONS
POLYMERS
REFLECTION
SILICON