Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

Shir, Daniel J.; Nelson, Erik C.; Chanda, Debashis; Brzezinski, Andrew; Braun, Paul V.; Rogers, John A.

doi:10.1116/1.3456181

Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

Journal Article · Wed Jul 07 00:00:00 EDT 2010 · Journal of Vacuum Science and Technology B

DOI:https://doi.org/10.1116/1.3456181· OSTI ID:1875137

Shir, Daniel J. ^[1]; Nelson, Erik C. ^[2]; Chanda, Debashis ^[2]; Brzezinski, Andrew ^[2]; Braun, Paul V. ^[2]; Rogers, John A. ^[2]

Univ. of Illinois at Urbana-Champaign, IL (United States); Univ. of California, Santa Barbara, CA (United States); University of Illinois
Univ. of Illinois at Urbana-Champaign, IL (United States); Univ. of California, Santa Barbara, CA (United States)

The authors describe the fabrication and characterization of three dimensional silicon inverse woodpile photonic crystals. Here, a dual exposure, two-photon, conformal phasemask technique is used to create high quality polymer woodpile structures over large areas with geometries that quantitatively match expectations based on optical simulations. Depositing silicon into these templates followed by the removal of the polymer results in silicon inverse woodpile photonic crystals for which calculations indicate a wide, complete photonic bandgap over a range of structural fill fractions. Spectroscopic measurements of normal incidence reflection from both the polymer and silicon photonic crystals reveal good optical properties.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of Illinois at Urbana-Champaign, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division

Grant/Contract Number:: FG02-07ER46471; SC0001293; FG02-07ER46453

OSTI ID:: 1875137

Alternate ID(s):: OSTI ID: 1380396

Journal Information:: Journal of Vacuum Science and Technology B, Journal Name: Journal of Vacuum Science and Technology B Journal Issue: 4 Vol. 28; ISSN 2166-2746

Publisher:: American Vacuum Society / AIPCopyright Statement

Country of Publication:: United States

Language:: English

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Rapid and Large‐Scale Fabrication of Full Color Woodpile Photonic Crystals via Interference from a Conformal Multilevel Phase Mask Nam, Sang‐Hyeon; Park, Junyong; Jeon, Seokwoo Advanced Functional Materials, Vol. 29, Issue 44 https://doi.org/10.1002/adfm.201904971	journal	August 2019
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