C{sub 2} swan band emission intensity as a function of C{sub 2} density.

Journal Article · Fri May 01 04:00:00 EDT 1998 · Plasma Sources Sci. Technol.

DOI:https://doi.org/10.1088/0963-0252/7/2/009· OSTI ID:938168

Goyette, A N; Lawler, J E; Anderson, L W; Gruen, D M; McCauley, T G; Zhou, D; Krauss, A R

We report the systematic comparison of the optical emission intensity of the d {sup 3}{Pi} {yields} a {sup 3}{Pi} (0, 0) vibrational band of the C{sub 2} Swan system with the absolute C{sub 2} concentration in Ar/H{sub 2}/CH{sub 4} and Ar/H{sub 2}/C{sub 60} microwave plasmas used in the deposition of nanocrystalline diamond. The absolute C{sub 2} concentration is obtained using white-light absorption spectroscopy. Emission intensity correlates linearly with C{sub 2} density for variations of several plasma parameters and across two decades of species concentration. Although optical emission intensity generally is not an accurate quantitative diagnostic for gas phase species concentrations, these results confirm the reliability of the (0,0) Swan band for relative determination of C{sub 2} density with high sensitivity under conditions used for hydrogen-deficient plasma-enhanced chemical vapor deposition of diamond.

• Research Organization: Argonne National Laboratory (ANL)
• Sponsoring Organization: DOD; ER
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 938168
• Report Number(s): ANL/CHM/JA-27823
• Journal Information: Plasma Sources Sci. Technol., Journal Name: Plasma Sources Sci. Technol. Journal Issue: 2 ; May 1998 Vol. 7; ISSN 0963-0252
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

36 MATERIALS SCIENCE
ABSORPTION SPECTROSCOPY
CHEMICAL VAPOR DEPOSITION
DEPOSITION
PLASMA
RELIABILITY
SENSITIVITY
VIBRATIONAL STATES