An analysis of the x-ray linear dichroism spectrum for NiO thin films grown on vicinal Ag(001)
Journal Article
·
· PHYSICAL REVIEW B
Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spin exhibits an in-plane spin reorientation transition from parallel to perpendicular to the step edges with increasing the NiO film thickness. In addition to the conventional L{sub 2} adsorption edge, x-ray linear dichroism (XLD) effect at the Ni L{sub 3} adsorption edge is also measured and analyzed. The result identifies a small energy shift of the L{sub 3} peak. Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x-rays originates entirely from the NiO magnetic ordering.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
- Sponsoring Organization:
- Advanced Light Source Division; Materials Sciences Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 937504
- Report Number(s):
- LBNL-961E
- Journal Information:
- PHYSICAL REVIEW B, Journal Name: PHYSICAL REVIEW B Vol. 78
- Country of Publication:
- United States
- Language:
- English
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