An analysis of the x-ray linear dichroism spectrum for NiO thin films grown on vicinal Ag(001)
Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spin exhibits an in-plane spin reorientation transition from parallel to perpendicular to the step edges with increasing the NiO film thickness. In addition to the conventional L{sub 2} adsorption edge, x-ray linear dichroism (XLD) effect at the Ni L{sub 3} adsorption edge is also measured and analyzed. The result identifies a small energy shift of the L{sub 3} peak. Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x-rays originates entirely from the NiO magnetic ordering.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
- Sponsoring Organization:
- Advanced Light Source Division; Materials Sciences Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 937504
- Report Number(s):
- LBNL-961E
- Journal Information:
- PHYSICAL REVIEW B, Journal Name: PHYSICAL REVIEW B Vol. 78
- Country of Publication:
- United States
- Language:
- English
Similar Records
Continuous spin reorientation transition in epitaxially grown antiferromagnetic NiO thin films
Effect of NiO spin orientation on the magnetic anisotropy of the Fe film in epitaxially grown Fe/NiO/Ag(001) and Fe/NiO/MgO(001)