An analysis of the x-ray linear dichroism spectrum for NiO thin films grown on vicinal Ag(001)

Journal Article · Sat May 10 00:00:00 EDT 2008 · PHYSICAL REVIEW B

DOI:https://doi.org/10.1103/PhysRevB.78.064413· OSTI ID:937504

Wu, Y Z; Zhao, Y; Arenholz, E; Young, A T; Sinkovic, B; Qiu, Z Q

Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spin exhibits an in-plane spin reorientation transition from parallel to perpendicular to the step edges with increasing the NiO film thickness. In addition to the conventional L{sub 2} adsorption edge, x-ray linear dichroism (XLD) effect at the Ni L{sub 3} adsorption edge is also measured and analyzed. The result identifies a small energy shift of the L{sub 3} peak. Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x-rays originates entirely from the NiO magnetic ordering.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: Advanced Light Source Division; Materials Sciences Division
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 937504
• Report Number(s): LBNL-961E; TRN: US0805803
• Journal Information: PHYSICAL REVIEW B, Vol. 78
• Country of Publication: United States
• Language: English

Related Subjects

75
ADSORPTION
DICHROISM
SPIN
SUBSTRATES
THICKNESS
THIN FILMS