Full-field hard x-ray microscopy below 30 nm : a challenging nanofabrication achievement.

Journal Article · Tue Jan 01 00:00:00 EST 2008 · Nanotechnology

DOI:https://doi.org/10.1088/0957-4484/19/39/395302· OSTI ID:937420

Chen, Y; Lo, T; Chu, Y; Yi, J; Liu, C; Wang, J; Wang, C; Chiu, C; Hua, T; Hwu, Y; Shen, Q; Yin, G; Liang, K; Lin, H; Je, J; Margaritondo, G; Sinica, Academia

The fabrication of devices to focus hard x-rays is one of the most difficult--and important--challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC); National Synchrotron Radiation Center (Taiwan); Naitonal Science and Technology for Nanoscience and Nanotechnology; Fonds National Suisse pour la Recherche Scientifique
• DOE Contract Number: DE-AC02-06CH11357
• OSTI ID: 937420
• Report Number(s): ANL/XSD/JA-62517; TRN: US200819%%33
• Journal Information: Nanotechnology, Vol. 19, Issue 2008
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
99 GENERAL AND MISCELLANEOUS//MATHEMATICS, COMPUTING, AND INFORMATION SCIENCE
HARD X RADIATION
FOCUSING
FRESNEL LENS
ASPECT RATIO
FABRICATION
MICROSCOPY
SPATIAL RESOLUTION
NANOSTRUCTURES