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Title: Composition and method for removing photoresist materials from electronic components

Abstract

Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.

Inventors:
 [1];  [2];  [3]
  1. Santa Fe, NM
  2. Los Alamos, NM
  3. Jemez Springs, NM
Publication Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
936715
Patent Number(s):
7,381,694
Application Number:
11/034,519
Assignee:
Los Alamos National Security, LLC (Los Alamos, NM)
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Davenhall, Leisa B, Rubin, James B, and Taylor, Craig M. V. Composition and method for removing photoresist materials from electronic components. United States: N. p., 2008. Web.
Davenhall, Leisa B, Rubin, James B, & Taylor, Craig M. V. Composition and method for removing photoresist materials from electronic components. United States.
Davenhall, Leisa B, Rubin, James B, and Taylor, Craig M. V. 2008. "Composition and method for removing photoresist materials from electronic components". United States. https://www.osti.gov/servlets/purl/936715.
@article{osti_936715,
title = {Composition and method for removing photoresist materials from electronic components},
author = {Davenhall, Leisa B and Rubin, James B and Taylor, Craig M. V.},
abstractNote = {Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.},
doi = {},
url = {https://www.osti.gov/biblio/936715}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2008},
month = {6}
}