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Title: Composition and method for removing photoresist materials from electronic components

Abstract

Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.

Inventors:
; ;
Publication Date:
Research Org.:
University Of California, The Regents Of
Sponsoring Org.:
USDOE
OSTI Identifier:
1175216
Patent Number(s):
6,846,789
Application Number:
10/133,709
Assignee:
The Regents of the University of California (Los Alamos, NM) OSTI
DOE Contract Number:
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Davenhall, Leisa B., Rubin, James B., and Taylor, Craig M.. Composition and method for removing photoresist materials from electronic components. United States: N. p., 2005. Web.
Davenhall, Leisa B., Rubin, James B., & Taylor, Craig M.. Composition and method for removing photoresist materials from electronic components. United States.
Davenhall, Leisa B., Rubin, James B., and Taylor, Craig M.. 2005. "Composition and method for removing photoresist materials from electronic components". United States. doi:. https://www.osti.gov/servlets/purl/1175216.
@article{osti_1175216,
title = {Composition and method for removing photoresist materials from electronic components},
author = {Davenhall, Leisa B. and Rubin, James B. and Taylor, Craig M.},
abstractNote = {Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = 2005,
month = 1
}

Patent:

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  • The invention is a combination of at least one dense phase fluid and at least one dense phase fluid modifier which can be used to contact substrates for electronic parts such as semiconductor wafers or chips to remove photoresist materials which are applied to the substrates during manufacture of the electronic parts. The dense phase fluid modifier is one selected from the group of cyclic, aliphatic or alicyclic compounds having the functional group: ##STR1## wherein Y is a carbon, oxygen, nitrogen, phosphorus or sulfur atom or a hydrocarbon group having from 1 to 10 carbon atoms, a halogen or halogenatedmore » hydrocarbon group having from 1 to 10 carbon atoms, silicon or a fluorinated silicon group; and wherein R.sub.1 and R.sub.2 can be the same or different substituents; and wherein, as in the case where X is nitrogen, R.sub.1 or R.sub.2 may not be present. The invention compositions generally are applied to the substrates in a pulsed fashion in order to remove the hard baked photoresist material remaining on the surface of the substrate after removal of soft baked photoresist material and etching of the barrier layer.« less
  • Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.
  • A method of removing ash components from coals, particularly high-ash bituminous and sub-bituminous coals, comprises grinding the coals and suspending the ground coal in an aqueous media to form a raw suspension, fusing the raw suspension and without further additives stirring for 60 to 360 minutes at from 250 to 350/sup 0/C and at a pressure of from 50 to 80 atm. Thereupon, the fused suspension is cooled and the pressure thereof is relieved. The aqueous phase containing the dissolved ash components is separated from the coal.