Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin.
No abstract prepared.
- Research Organization:
- Argonne National Laboratory (ANL)
- Sponsoring Organization:
- SC; USDOE
- DOE Contract Number:
- AC02-06CH11357
- OSTI ID:
- 927748
- Report Number(s):
- ANL/MSD/JA-60634
- Journal Information:
- J. Vac. Sci. Technol. A, Journal Name: J. Vac. Sci. Technol. A Journal Issue: 2 ; Mar./Apr. 2008 Vol. 26; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- ENGLISH
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