Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics
Journal Article
·
· Journal of Vacuum Science and Technology B
The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.
- Research Organization:
- Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
- Sponsoring Organization:
- USDOE Director. Office of Science. Basic EnergySciences
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 923472
- Report Number(s):
- LBNL--63272; BnR: KC0202020
- Journal Information:
- Journal of Vacuum Science and Technology B, Journal Name: Journal of Vacuum Science and Technology B Journal Issue: 6 Vol. 25
- Country of Publication:
- United States
- Language:
- English
Similar Records
Etched-multilayer phase shifting masks for EUV lithography
High efficiency multilayer blazed gratings for EUV and soft X-rays: Recent developments
EUV Binary Phase Gratings: Fabrication and Application toDiffractive Optics
Patent
·
Tue Apr 05 00:00:00 EDT 2005
·
OSTI ID:1175305
High efficiency multilayer blazed gratings for EUV and soft X-rays: Recent developments
Conference
·
Tue Jul 26 00:00:00 EDT 2011
·
OSTI ID:1045927
EUV Binary Phase Gratings: Fabrication and Application toDiffractive Optics
Journal Article
·
Mon Jan 31 23:00:00 EST 2005
· Journal of Vacuum Science and Technology
·
OSTI ID:887185