EUV Binary Phase Gratings: Fabrication and Application toDiffractive Optics

Journal Article · Tue Feb 01 00:00:00 EST 2005 · Journal of Vacuum Science and Technology

OSTI ID:887185

Salmassi, F; Naulleau, P P; Gullikson, E M; Olynick, D L; Liddle, J A

Diffractive optics play an important role in a variety of fields such as astronomy, microscopy, and lithography. For the extreme ultraviolet (EUV) region of the spectrum they have been difficult to make due to the extremely precise control required of their surface structure. We have developed a robust fabrication technique that achieves the required topographic control through the deposition of a thin film of Si on a Cr etch stop. We have fabricated binary phase gratings using this approach that have an efficiency of 80% of the theoretical maximum. The technique is applicable to any type of binary phase optical element.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Director, Office of Science. Office of Basic EnergySciences. Materials Science and Engineering Division
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 887185
• Report Number(s): LBNL-56785-Journal; R&D Project: M50044; BnR: 600301020; TRN: US200617%%589
• Journal Information: Journal of Vacuum Science and Technology, Vol. 24, Issue 4; Related Information: Journal Publication Date: 07/2006
• Country of Publication: United States
• Language: English

Related Subjects

47 OTHER INSTRUMENTATION
ASTRONOMY
DEPOSITION
EFFICIENCY
FABRICATION
MICROSCOPY
OPTICS
THIN FILMS