Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics

Journal Article · Sat Jul 15 00:00:00 EDT 2006 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.2212435· OSTI ID:20777310

Salmassi, F; Naulleau, P P; Gullikson, E M; Olynick, D L; Liddle, J A ^[1]

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1. Center for X-Ray Optics (CXRO), Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

Diffractive optics play an important role in a variety of fields such as astronomy, microscopy, and lithography. In the extreme ultraviolet region of the spectrum they have been difficult to make due to the extremely precise control required of their surface structure. We have developed a robust fabrication technique that achieves the required topographic control through the deposition of a thin film of Si on a Cr etch stop. We have fabricated binary phase gratings using this approach that have an efficiency of 80% of the theoretical maximum. This technique could be applicable to similar binary phase structures requiring precise topography control.

• OSTI ID: 20777310
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 24, Issue 4; Other Information: DOI: 10.1116/1.2212435; (c) 2006 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CONTROL
DEPOSITION
DIFFRACTION GRATINGS
ETCHING
EXTREME ULTRAVIOLET RADIATION
FABRICATION
GRATINGS
OPTICS
SEMICONDUCTOR MATERIALS
SILICON
SURFACES
THIN FILMS