Fabrication of diffractive optical components for an extreme ultraviolet shearing interferometer

Journal Article · Tue Nov 01 00:00:00 EST 1994 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)

DOI:https://doi.org/10.1116/1.587452· OSTI ID:6867003

Spector, S J ^[1]; Tennant, D M ^[2]; Tan, Z ^[3]; Bjorkholm, J E ^[2]

---

1. Department of Physics, State University of New York at Stony Brook, Stony Brook, New York 11794 (United States)
2. AT T Bell Laboratories, Holmdel, New Jersey 07733 (United States)
3. AT T Bell Laboratories, 510E Brookhaven National Laboratory, Upton, New York 11973 (United States)

We have constructed four optical components for use in an extreme ultraviolet shearing interferometer which will operate at a wavelength of 13.4 nm. The components that have been constructed include transmission diffractive optical components such as a Fresnel zone plate, angled gratings, and two-frequency gratings, as well as pinhole apertures. All the components are fabricated in 110 nm of Ge, which is supported by a 0.5--0.7-[mu]m-thick membrane of Si. The patterns were fabricated by first evaporating Ge and then spinning 100 nm polymethylmethacrylate (PMMA) onto the Si membranes. The desired patterns were exposed in the PMMA resist using electron beam lithography. Custom interative computer programs generated the patterns used to control the exposure. After developing the PMMA resist the Ge layer was etched using a reactive ion etching technique. Electron microscopy of the finished components show that the smallest features in our components are cleanly constructed, and the linewidths and placement of the features meet the desired accuracy.

• OSTI ID: 6867003
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Vol. 12:6; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
INTERFEROMETERS
FABRICATION
APERTURES
ETCHING
EXTREME ULTRAVIOLET RADIATION
GERMANIUM
PMMA
SILICON
ELECTROMAGNETIC RADIATION
ELEMENTS
ESTERS
MEASURING INSTRUMENTS
METALS
OPENINGS
ORGANIC COMPOUNDS
ORGANIC POLYMERS
POLYACRYLATES
POLYMERS
POLYVINYLS
RADIATIONS
SEMIMETALS
SURFACE FINISHING
ULTRAVIOLET RADIATION
661300* - Other Aspects of Physical Science- (1992-)