Mechanism for hierarchical self-assembly of nanoparticles on scaffolds derived from block copolymers.

Conference · Sun Jul 01 04:00:00 EDT 2007 · Surf. Sci.

DOI:https://doi.org/10.1016/j.susc.2006.11.052· OSTI ID:917225

Darling, S B

Lithographically patterned substrates can direct the self-assembly of block copolymer films into aligned structures that, in turn, template the self-organization of colloidal nanoparticles. Deposition on pristine diblock copolymer films does not lead to reproducible selective decoration, but films modified to have nanoscale corrugation act as scaffolds for highly selective nanoparticle adsorption. The mechanism for this selectivity relies on the lateral forces inherent to spin casting to remove all of the nanoparticle suspension not confined within the nanoscopic trenches. This technique does not rely on interactions between the surfactant capping molecules and the polymer and is therefore general to a wide class of nanoparticle materials. Prospects to obtain long-range ordering and associated potential applications are discussed.

• Research Organization: Argonne National Laboratory (ANL)
• Sponsoring Organization: SC
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 917225
• Report Number(s): ANL/MSD/CP-119012
• Conference Information: Journal Name: Surf. Sci. Journal Issue: 13 ; Jul, 1, 2007 Journal Volume: 601
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

36 MATERIALS SCIENCE
ADSORPTION
CASTING
COPOLYMERS
DEPOSITION
NANOSTRUCTURES
POLYMERS
SPIN
SUBSTRATES
SURFACTANTS