A route to nanoscopic materials via seeded sequential infiltration synthesis on block copolymer templates.

Journal Article · Wed Jun 01 04:00:00 EDT 2011 · ACS Nano

DOI:https://doi.org/10.1021/nn2003234· OSTI ID:1019244

Peng, Q; Tseng, Y -C; Darling, S B; Elam, J W ^[1]

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1. Center for Nanoscale Materials

Sequential infiltration synthesis (SIS), combining stepwise molecular assembly reactions with self-assembled block copolymer (BCP) substrates, provides a new strategy to pattern nanoscopic materials in a controllable way. The selective reaction of a metal precursor with one of the pristine BCP domains is the key step in the SIS process. Here we present a straightforward strategy to selectively modify self-assembled polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP thin films to enable the SIS of a variety of materials including SiO{sub 2}, ZnO, and W. The selective and controlled interaction of trimethyl aluminum with carbonyl groups in the PMMA polymer domains generates Al-CH{sub 3}/Al-OH sites inside the BCP scaffold which can seed the subsequent growth of a diverse range of materials without requiring complex block copolymer design and synthesis.

• Research Organization: Argonne National Laboratory (ANL)
• Sponsoring Organization: SC
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 1019244
• Report Number(s): ANL/ES/JA-69426
• Journal Information: ACS Nano, Journal Name: ACS Nano Journal Issue: 6 ; Jun. 2011 Vol. 5; ISSN 1936-0851
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
CARBONYLS
COPOLYMERS
DEPOSITION
DESIGN
POLYMERS
PRECURSOR
SEEDS
SILICON
SUBSTRATES
SYNTHESIS
THIN FILMS