A route to nanoscopic materials via seeded sequential infiltration synthesis on block copolymer templates.
- Center for Nanoscale Materials
Sequential infiltration synthesis (SIS), combining stepwise molecular assembly reactions with self-assembled block copolymer (BCP) substrates, provides a new strategy to pattern nanoscopic materials in a controllable way. The selective reaction of a metal precursor with one of the pristine BCP domains is the key step in the SIS process. Here we present a straightforward strategy to selectively modify self-assembled polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP thin films to enable the SIS of a variety of materials including SiO{sub 2}, ZnO, and W. The selective and controlled interaction of trimethyl aluminum with carbonyl groups in the PMMA polymer domains generates Al-CH{sub 3}/Al-OH sites inside the BCP scaffold which can seed the subsequent growth of a diverse range of materials without requiring complex block copolymer design and synthesis.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 1019244
- Report Number(s):
- ANL/ES/JA-69426; TRN: US201114%%714
- Journal Information:
- ACS Nano, Vol. 5, Issue 6 ; Jun. 2011
- Country of Publication:
- United States
- Language:
- ENGLISH
Similar Records
Kinetics for the Sequential Infiltration Synthesis of Alumina in Poly(methyl methacrylate): An Infrared Spectroscopic Study
Ultra-Fast Vertical Ordering of Lamellar Block Copolymer Films on Unmodified Substrates