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Title: Block copolymer nanolithography for the fabrication of patterned media.

Abstract

Abstract Bit patterned perpendicular media has the potential to increase the density of magnetic recording beyond what can be achieved by granular media. Self assembling diblock copolymers are of interest as templates for patterned media, as they potentially provide a low cost fabrication route. A method to fabricate the desired pattern using cylinder forming diblock copolymers of (PS-b-PMMA) as template is reported. Upon phase separation hexagonally packed cylinders of the minority phase (PMMA) surrounded by the continuous majority phase (PS) are obtained. The processing sequence began with spin coating the block copolymer on a suitable substrate, followed by annealing the block copolymer thin film in vacuum to orient it perpendicular to the substrate. Block copolymer templates were obtained by glacial acetic acid treatment which opened the pores in the block copolymer thin film. Ni was electrodeposited in the block copolymer templates and this pattern was then transferred onto the underlying substrate by ion milling

Authors:
 [1];  [1];  [1];  [1];  [1];  [2];  [2]
  1. ORNL
  2. Argonne National Laboratory (ANL)
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Center for Nanophase Materials Sciences
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
962605
DOE Contract Number:
DE-AC05-00OR22725
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Research Society Symposium Proceedings; Journal Volume: 1032
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COPOLYMERS; FABRICATION; MAGNETIC STORAGE DEVICES; PMMA; POLYSTYRENE; NICKEL; ELECTRODEPOSITION; THIN FILMS; SUBSTRATES

Citation Formats

Warke, Vishal V, Bakker, Martin G, Hong, Kunlun, Mays, Jimmy, Britt, Phillip F, Li, Xuefa, and Wang, Jin. Block copolymer nanolithography for the fabrication of patterned media.. United States: N. p., 2008. Web.
Warke, Vishal V, Bakker, Martin G, Hong, Kunlun, Mays, Jimmy, Britt, Phillip F, Li, Xuefa, & Wang, Jin. Block copolymer nanolithography for the fabrication of patterned media.. United States.
Warke, Vishal V, Bakker, Martin G, Hong, Kunlun, Mays, Jimmy, Britt, Phillip F, Li, Xuefa, and Wang, Jin. Tue . "Block copolymer nanolithography for the fabrication of patterned media.". United States. doi:.
@article{osti_962605,
title = {Block copolymer nanolithography for the fabrication of patterned media.},
author = {Warke, Vishal V and Bakker, Martin G and Hong, Kunlun and Mays, Jimmy and Britt, Phillip F and Li, Xuefa and Wang, Jin},
abstractNote = {Abstract Bit patterned perpendicular media has the potential to increase the density of magnetic recording beyond what can be achieved by granular media. Self assembling diblock copolymers are of interest as templates for patterned media, as they potentially provide a low cost fabrication route. A method to fabricate the desired pattern using cylinder forming diblock copolymers of (PS-b-PMMA) as template is reported. Upon phase separation hexagonally packed cylinders of the minority phase (PMMA) surrounded by the continuous majority phase (PS) are obtained. The processing sequence began with spin coating the block copolymer on a suitable substrate, followed by annealing the block copolymer thin film in vacuum to orient it perpendicular to the substrate. Block copolymer templates were obtained by glacial acetic acid treatment which opened the pores in the block copolymer thin film. Ni was electrodeposited in the block copolymer templates and this pattern was then transferred onto the underlying substrate by ion milling},
doi = {},
journal = {Materials Research Society Symposium Proceedings},
number = ,
volume = 1032,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2008},
month = {Tue Jan 01 00:00:00 EST 2008}
}