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Structural properties of epitaxial gamma-Al2O3(111) thin films on 4H-SiC(0001)

Journal Article · · Appl. Phys. Lett. 90:061916,2007
DOI:https://doi.org/10.1063/1.2435978· OSTI ID:900999
No abstract prepared.
Research Organization:
Stanford Linear Accelerator Center (SLAC)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-76SF00515
OSTI ID:
900999
Report Number(s):
SLAC-REPRINT-2007-016
Journal Information:
Appl. Phys. Lett. 90:061916,2007, Journal Name: Appl. Phys. Lett. 90:061916,2007 Vol. 90; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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