Critical dimension sensitivity to post-exposure bake temperaturevariation in EUV photoresists
Conference
·
OSTI ID:900653
Chemically amplified resists depend upon the post-exposure bake (PEB) process to drive the deprotection reactions (in positive resists) that lead to proper resist development. For this reason they often exhibit critical dimension (CD) sensitivity to PEB temperature variation. In this work the effects of variation in different aspects of the PEB step on post-develop CD are studied for two extreme ultraviolet (EUV) photoresists. The spatial and temporal temperature uniformity of the PEB plate is measured using a wireless sensor wafer. Programmed variations in the bake plate temperature set point are then used to measure the CD sensitivity to steady state temperature variation. In addition, the initial temperature ramp time is modified using a thin sheet of polyimide film between the wafer and the bake plate. This allows for measurement of the CD sensitivity to transient temperature variation. Finally, the bake time is adjusted to measure the CD sensitivity to this parameter.
- Research Organization:
- Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
- Sponsoring Organization:
- USDOE Director. Office of Science. Office of Basic EnergySciences; Advanced Micro Devices, Applied Materials, Atmel, Cadence,Canon, Cymer, DuPont, Ebara, Intel, KLA-Tencor, Mentor Gaphics, NikonResearch, Novellus /systems, Panoramic Technologies, Photronics,Synopsis, Tokyo Electron, UC Discovery Grant
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 900653
- Report Number(s):
- LBNL--60545; BnR: 600303000
- Country of Publication:
- United States
- Language:
- English
Similar Records
Don't always blame the photons: Relationships between deprotection blur, LER, and shot noise in EUV photoresists
High precision monitoring of outgassing species in model EUV photoresists with a cavity ring-down spectrometer
Deprotection blue in extreme ultraviolet photoresists: influence of base loading and post-exposure bake temperture
Journal Article
·
Mon Jun 02 00:00:00 EDT 2008
· JVST B
·
OSTI ID:950847
High precision monitoring of outgassing species in model EUV photoresists with a cavity ring-down spectrometer
Conference
·
Mon Apr 21 20:00:00 EDT 2025
·
OSTI ID:3005785
Deprotection blue in extreme ultraviolet photoresists: influence of base loading and post-exposure bake temperture
Journal Article
·
Mon Jun 02 00:00:00 EDT 2008
· JVST B
·
OSTI ID:941690